Structural, magnetic and mechanical properties of 5 µm thick SmCo films for use in Micro-Electro-Mechanical-Systems

5µm thick SmCo films were deposited onto Si substrates using triode sputtering. A study of the influence of deposition temperature (Tdep ≤ 600°C) on the structural, magnetic and mechanical properties has shown that optimum properties (highest degree of in-plane texture, maximum in-plane coercivity and remanence (1.3 and 0.8 T, respectively), no film peel-off) are achieved for films deposited at the relatively low temperature of 350°C. This temperature is compatible with film integration into Micro-Electro-Mechanical-Systems (MEMS). The deposition rate was increased from 3.6 to 18 µm/h by increasing the surface area of the target from 7 to 81 cm2. Mechanically stable films could be prepared by deposition onto pre-patterned films or deposition through holes in a mask