International audienceAn investigation of InN layers grown on GaN templates by molecular beam epitaxy (MBE) has been carried out by X-ray diffraction (XRD), Raman spectroscopy (RS) and photoluminescence (PL). A good correlation is noticed between their crystalline quality and optical properties. The best samples exhibit a PL emission between 0.6 and 0.7 eV. The surface structure was quite different from one sample to the other, pointing out to a critical role of the growth conditions, which probably need to be tightly optimized for a good reproducibility
Recent developments on RF-MBE growth of InN and InGaN and those structural and property characteriza...
The III-nitride conductors are promising materials for the application to optoelectronic devices. Th...
The III-nitride conductors are promising materials for the application to optoelectronic devices. Th...
International audienceAn investigation of InN layers grown on GaN templates by molecular beam epitax...
International audienceAn investigation of InN layers grown on GaN templates by molecular beam epitax...
International audienceAn investigation of InN layers grown on GaN templates by molecular beam epitax...
International audienceA series of InN layers grown by different techniques has been investigated by ...
International audienceA series of InN layers grown by different techniques has been investigated by ...
International audienceA series of InN layers grown by different techniques has been investigated by ...
Indium nitride (InN) films were grown on sapphire substrates by radio-frequency plasma-excited molec...
International audienceA series of InN layers grown by different techniques has been investigated by ...
International audienceWe report on the properties of high quality HVPE InN and on successful subsequ...
International audienceWe report on the properties of high quality HVPE InN and on successful subsequ...
International audienceWe report on the properties of high quality HVPE InN and on successful subsequ...
International audienceWe report on the properties of high quality HVPE InN and on successful subsequ...
Recent developments on RF-MBE growth of InN and InGaN and those structural and property characteriza...
The III-nitride conductors are promising materials for the application to optoelectronic devices. Th...
The III-nitride conductors are promising materials for the application to optoelectronic devices. Th...
International audienceAn investigation of InN layers grown on GaN templates by molecular beam epitax...
International audienceAn investigation of InN layers grown on GaN templates by molecular beam epitax...
International audienceAn investigation of InN layers grown on GaN templates by molecular beam epitax...
International audienceA series of InN layers grown by different techniques has been investigated by ...
International audienceA series of InN layers grown by different techniques has been investigated by ...
International audienceA series of InN layers grown by different techniques has been investigated by ...
Indium nitride (InN) films were grown on sapphire substrates by radio-frequency plasma-excited molec...
International audienceA series of InN layers grown by different techniques has been investigated by ...
International audienceWe report on the properties of high quality HVPE InN and on successful subsequ...
International audienceWe report on the properties of high quality HVPE InN and on successful subsequ...
International audienceWe report on the properties of high quality HVPE InN and on successful subsequ...
International audienceWe report on the properties of high quality HVPE InN and on successful subsequ...
Recent developments on RF-MBE growth of InN and InGaN and those structural and property characteriza...
The III-nitride conductors are promising materials for the application to optoelectronic devices. Th...
The III-nitride conductors are promising materials for the application to optoelectronic devices. Th...