The water droplet laser plasma source has been shown to have many attractive features as a continuous, almost debris-free source for extreme ultraviolet (EUV) and X-ray applications. Through a dual experimental and theoretical study, we analyze the interaction physics between the laser light and the target. The hydrodynamic laser plasma simulation code, Medusa103 is used to model the electron density distribution for comparison to electron density distributions obtained through Abel inversion of plasma interferograms. In addition, flat field EUV spectra are compared to synthetic spectra calculated with the atomic physics code RATION
Light sources based on laser plasmas using tin as target material are known to provide high conversi...
Extreme Ultraviolet (EUV) sources rely on droplet laser plasmas for EUV generation. These sources co...
An overview is given of the progress in the studies on a tin material limited-mass target which has ...
The water droplet laser plasma source has been shown to have many attractive features as a continuou...
As a mass limited target the water droplet laser plasma source has been shown to have many attractiv...
The droplet laser plasma source has many attractive features as a continuous, almost debris-free sou...
We have configured a new type of target for laser plasma x-ray generation. This target consists of a...
Liquid droplet-target laser plasma sources were presented for extreme ultraviolet lithography. A tar...
Laser light coupling physics in high repetition rate laser-plasma droplet-target X-ray point sources...
The advancement of laboratory based Extreme Ultraviolet (EUV) radiation has escalated with the desir...
Detailed understanding of the complex UTA emission from Xe and Sn laser plasmas is imperative to the...
The development of a laser-plasma EUV line emission source based on frozen water droplet targets whi...
Previous work with a 100-kHz water droplet system generated 13-nm and 116-nm line emissions from a L...
We have previously reported encouraging results with a new type of laser plasma source. As a radiati...
Extreme ultraviolet lithography(EUVL) is being developed worldwide as the next generation technology...
Light sources based on laser plasmas using tin as target material are known to provide high conversi...
Extreme Ultraviolet (EUV) sources rely on droplet laser plasmas for EUV generation. These sources co...
An overview is given of the progress in the studies on a tin material limited-mass target which has ...
The water droplet laser plasma source has been shown to have many attractive features as a continuou...
As a mass limited target the water droplet laser plasma source has been shown to have many attractiv...
The droplet laser plasma source has many attractive features as a continuous, almost debris-free sou...
We have configured a new type of target for laser plasma x-ray generation. This target consists of a...
Liquid droplet-target laser plasma sources were presented for extreme ultraviolet lithography. A tar...
Laser light coupling physics in high repetition rate laser-plasma droplet-target X-ray point sources...
The advancement of laboratory based Extreme Ultraviolet (EUV) radiation has escalated with the desir...
Detailed understanding of the complex UTA emission from Xe and Sn laser plasmas is imperative to the...
The development of a laser-plasma EUV line emission source based on frozen water droplet targets whi...
Previous work with a 100-kHz water droplet system generated 13-nm and 116-nm line emissions from a L...
We have previously reported encouraging results with a new type of laser plasma source. As a radiati...
Extreme ultraviolet lithography(EUVL) is being developed worldwide as the next generation technology...
Light sources based on laser plasmas using tin as target material are known to provide high conversi...
Extreme Ultraviolet (EUV) sources rely on droplet laser plasmas for EUV generation. These sources co...
An overview is given of the progress in the studies on a tin material limited-mass target which has ...