Thin films of silicon carbide nitride (SiC x N y ) were deposited in an r.f. magnetron sputtering system using a SiC target. Films of different compositions were deposited by varying the ratios of argon and nitrogen in the sputtering ambient. X-ray photoelectron spectroscopy and atomic force microscopy studies on the deposited films indicated that the chemical states as well as the surface roughness are highly sensitive to the nitrogen ratios during sputtering. © 2001 Elsevier Science B.V. All rights reserved
Thin films of amorphous silicon carbide nitride (a-SiCxNy) were deposited in a rf magnetron sputteri...
Amorphous thin films of silicon boron carbon nitride (SiCBN) were deposited in a multigun radio freq...
Electrical studies on amorphous silicon carbide nitride films were presented. Thin films of silicon ...
Thin films of silicon carbide nitride (SiCxNy) were deposited in an r.f. magnetron sputtering system...
Thin films of amorphous silicon carbide nitride (a-SiCxNy) were deposited in a rf magnetron sputteri...
Thin films of amorphous silicon carbide nitride (a-SiCxNy) were deposited in a rf magnetron sputteri...
In this work we report the deposition and characterization of amorphous thin films of silicon boron ...
Silicon carbonitride films were deposited on Si (100), Ge (111), and fused silica substrates through...
In this work we report the deposition and characterization of amorphous thin films of silicon boron ...
Amorphous nitrogen-doped silicon carbide (a-SiCxNy) thin films were deposited on Si substrates by RF...
Silicon carbide thin films (Si(x)C(y)) were deposited in a RF (13.56 MHz) magnetron sputtering syste...
AbstractAmorphous silicon oxycarbonitride (SiCxNyOz) films have been deposited on Si substrates by l...
Thin films of silicon carbide nitride (SiCN) have been prepared by reactive radioactive frequency (r...
Thin films of silicon carbide nitride (SiCN) have been prepared by reactive radioactive frequency (r...
Thin films of amorphous silicon carbide nitride (a- SiCx Ny) were deposited in a rf magnetron sputte...
Thin films of amorphous silicon carbide nitride (a-SiCxNy) were deposited in a rf magnetron sputteri...
Amorphous thin films of silicon boron carbon nitride (SiCBN) were deposited in a multigun radio freq...
Electrical studies on amorphous silicon carbide nitride films were presented. Thin films of silicon ...
Thin films of silicon carbide nitride (SiCxNy) were deposited in an r.f. magnetron sputtering system...
Thin films of amorphous silicon carbide nitride (a-SiCxNy) were deposited in a rf magnetron sputteri...
Thin films of amorphous silicon carbide nitride (a-SiCxNy) were deposited in a rf magnetron sputteri...
In this work we report the deposition and characterization of amorphous thin films of silicon boron ...
Silicon carbonitride films were deposited on Si (100), Ge (111), and fused silica substrates through...
In this work we report the deposition and characterization of amorphous thin films of silicon boron ...
Amorphous nitrogen-doped silicon carbide (a-SiCxNy) thin films were deposited on Si substrates by RF...
Silicon carbide thin films (Si(x)C(y)) were deposited in a RF (13.56 MHz) magnetron sputtering syste...
AbstractAmorphous silicon oxycarbonitride (SiCxNyOz) films have been deposited on Si substrates by l...
Thin films of silicon carbide nitride (SiCN) have been prepared by reactive radioactive frequency (r...
Thin films of silicon carbide nitride (SiCN) have been prepared by reactive radioactive frequency (r...
Thin films of amorphous silicon carbide nitride (a- SiCx Ny) were deposited in a rf magnetron sputte...
Thin films of amorphous silicon carbide nitride (a-SiCxNy) were deposited in a rf magnetron sputteri...
Amorphous thin films of silicon boron carbon nitride (SiCBN) were deposited in a multigun radio freq...
Electrical studies on amorphous silicon carbide nitride films were presented. Thin films of silicon ...