Add to ORKGThe dielectric properties of electrochemically grown zirconium oxide films by anodisation of zirconium in 1.0 mol dm?3 phosphoric acid solution were investigated in a 3 to 30 V potential range with a view to inducing surface modifications for eventual use in biomedical and electronic applications. The oxide films grown at different potentials were characterised by Atomic Force Microscopy, X-ray photoelectron and Raman spectroscopies; the latter demonstrated the incorporation of phosphate ions into the passive films. Flat band potentials calculated from the Mott-Shottky analysis of the oxides semiconducting properties confirm the bilayer structure of the films. The oxide dielectric permittivity was evaluated from impedance spectroscopy...
Zirconium oxide (ZrO2) is an important material with a potential for a wide range of technological a...
The objective of the present work is to study the effect of electrical process Parameters (duty cycl...
Although originally used almost exclusively in the nuclear energy industry due to its low neutron ab...
The paper is focused on elaboration of ZrO2 films on pure zirconium via anodizing inphosphoric acid ...
ZrO2 is a ceramic material suitable for high-temperature coatings, fuel cells as a solid proton-cond...
Zirconia (ZrO2) is a promising material for future high-k gate dielectric applications. With the dec...
photoelectrochemical investigation on anodic films of different thickness grown on sputter-deposited...
The present work was aimed at developing the corrosion resistant and bioactive oxide film on zirconi...
Thin films of ZrO2 have been deposited by ALD on Si(100) and SIMOX using two different metalorganic ...
Studies on the influence of the nature of the growth electrolyte on the properties of oxide films gr...
Zirconium oxide (ZrO2) is a widely utilized inorganic material with excellent dielectric, optical, a...
Zirconium oxide (ZrO2) is an important material with a potential for a wide range of technological a...
Zr–Al alloys containing up to 26 at. % aluminum, prepared by magnetron sputtering, have been anodize...
Zirconium oxide (ZrO2) films were investigated as a potential replacement for silicon dioxide gate d...
Thin mixed and nanolaminate films of ZrO2 and Al2O3 were grown by atomic layer deposition from the c...
Zirconium oxide (ZrO2) is an important material with a potential for a wide range of technological a...
The objective of the present work is to study the effect of electrical process Parameters (duty cycl...
Although originally used almost exclusively in the nuclear energy industry due to its low neutron ab...
The paper is focused on elaboration of ZrO2 films on pure zirconium via anodizing inphosphoric acid ...
ZrO2 is a ceramic material suitable for high-temperature coatings, fuel cells as a solid proton-cond...
Zirconia (ZrO2) is a promising material for future high-k gate dielectric applications. With the dec...
photoelectrochemical investigation on anodic films of different thickness grown on sputter-deposited...
The present work was aimed at developing the corrosion resistant and bioactive oxide film on zirconi...
Thin films of ZrO2 have been deposited by ALD on Si(100) and SIMOX using two different metalorganic ...
Studies on the influence of the nature of the growth electrolyte on the properties of oxide films gr...
Zirconium oxide (ZrO2) is a widely utilized inorganic material with excellent dielectric, optical, a...
Zirconium oxide (ZrO2) is an important material with a potential for a wide range of technological a...
Zr–Al alloys containing up to 26 at. % aluminum, prepared by magnetron sputtering, have been anodize...
Zirconium oxide (ZrO2) films were investigated as a potential replacement for silicon dioxide gate d...
Thin mixed and nanolaminate films of ZrO2 and Al2O3 were grown by atomic layer deposition from the c...
Zirconium oxide (ZrO2) is an important material with a potential for a wide range of technological a...
The objective of the present work is to study the effect of electrical process Parameters (duty cycl...
Although originally used almost exclusively in the nuclear energy industry due to its low neutron ab...