A 2D quantum ballistic transport model based on the non-equilibrium Green's function formalism has been used to theoretically investigate the effects induced by an oxide crenel in a very short (7 nm) thin-film metal-oxide-semiconductor-field-effect-transistor. Our investigation shows that a well adjusted crenel permits an improvement of on-off current ratio Ion/Ioff of about 244% with no detrimental change in the drive current Ion. This remarkable result is explained by a nontrivial influence of crenel on conduction band-structure in thin-film. Therefore a well optimized crenel seems to be a good solution to have a much better control of short channel effects in transistor where the transport has a strong quantum behavior
Conductance has been studied in metal-oxide-silicon field-effect transistor accumulation-layer sampl...
In this work we show that junctionless nanowire transistor (JNT) exhibits lower degree of ballistici...
Conductance has been studied in metal-oxide-silicon field-effect transistor accumulation-layer sampl...
Experiments on ultra-small metal-oxide-semiconductor field effect transistors (MOSFETs) less than 10...
A real-space quantum transport simulator for graphenenanoribbon (GNR) metal-oxide-semiconductor fiel...
In the past twenty years, the channel length of metal-oxide-semiconductor field-effect transistors (...
The electric field perpendicular to the current flow is found to be significantly lower in junctionl...
Low-dimensional materials such as layered semiconductors or carbon nanotubes (CNTs) have been attrac...
Channel length of metal oxide semiconductor field effect transistors (MOSFETs) are scaling below 20 ...
The performance limits of carbon nanotube field-effect transistors (CNTFETs) are examined theoretica...
Rapporteurs: Christophe DELERUE, IEMN-CNRS, Lille; Philippe DOLLFUS, IEF-CNRS, Orsay; Examinateurs: ...
The performance limits of carbon nanotube field-effect transistors ~CNTFETs! are examined theoretica...
Rapporteurs: Christophe DELERUE, IEMN-CNRS, Lille; Philippe DOLLFUS, IEF-CNRS, Orsay; Examinateurs: ...
We report measurements on submicron metal-oxide-semiconductor field effect transistors equipped with...
Conductance has been studied in metal-oxide-silicon field-effect transistor accumulation-layer sampl...
Conductance has been studied in metal-oxide-silicon field-effect transistor accumulation-layer sampl...
In this work we show that junctionless nanowire transistor (JNT) exhibits lower degree of ballistici...
Conductance has been studied in metal-oxide-silicon field-effect transistor accumulation-layer sampl...
Experiments on ultra-small metal-oxide-semiconductor field effect transistors (MOSFETs) less than 10...
A real-space quantum transport simulator for graphenenanoribbon (GNR) metal-oxide-semiconductor fiel...
In the past twenty years, the channel length of metal-oxide-semiconductor field-effect transistors (...
The electric field perpendicular to the current flow is found to be significantly lower in junctionl...
Low-dimensional materials such as layered semiconductors or carbon nanotubes (CNTs) have been attrac...
Channel length of metal oxide semiconductor field effect transistors (MOSFETs) are scaling below 20 ...
The performance limits of carbon nanotube field-effect transistors (CNTFETs) are examined theoretica...
Rapporteurs: Christophe DELERUE, IEMN-CNRS, Lille; Philippe DOLLFUS, IEF-CNRS, Orsay; Examinateurs: ...
The performance limits of carbon nanotube field-effect transistors ~CNTFETs! are examined theoretica...
Rapporteurs: Christophe DELERUE, IEMN-CNRS, Lille; Philippe DOLLFUS, IEF-CNRS, Orsay; Examinateurs: ...
We report measurements on submicron metal-oxide-semiconductor field effect transistors equipped with...
Conductance has been studied in metal-oxide-silicon field-effect transistor accumulation-layer sampl...
Conductance has been studied in metal-oxide-silicon field-effect transistor accumulation-layer sampl...
In this work we show that junctionless nanowire transistor (JNT) exhibits lower degree of ballistici...
Conductance has been studied in metal-oxide-silicon field-effect transistor accumulation-layer sampl...