International audienceIn this paper we present a compact model of Double-Gate MOSFET architecture including ballistic and quasi-ballistic transport down to 20 nm channel length. In addition, this original model takes into account short channel effects (SCE/DIBL) by a simple analytical approach. The quasi-ballistic transport description is based on Lundstrom's backscattering coefficient given by the so-called flux method. We also include an original description of scattering of processes by introducing the “dynamical mean free path” formalism. Moreover, we implemented our model in a Verilog-A environment, and applied it to the simulation of circuit elements such as CMOS inverters and Ring Oscillators to analyze the impact of ballistic/quasi-...
Abstract—The scattering effects are studied in nanometer-scaled double-gate MOSFET using Monte Carlo...
Today, the MOSFET transistor reaches decananometer dimensions for which the effects of ballistic tra...
International Conference on Simulation of Semiconductor Processes and Devices, Hakone, JAPAN, SEP 09...
International audienceIn this paper we present a compact model of Double-Gate MOSFET architecture in...
International audienceWe developed an original physics-based unified analytical model describing the...
In this paper, the ballistic and quasi-ballistic transport characteristics of Sub-30 nm double gate ...
International audienceA drift-diffusion-like formulation for including ballistic and quasi-ballistic...
International audienceA drift-diffusion-like formulation for including ballistic and quasi-ballistic...
International audienceA drift-diffusion-like formulation for including ballistic and quasi-ballistic...
International audienceThe quasi-ballistic nature of transport in end of the roadmap MOSFETs device i...
International audienceThe quasi-ballistic nature of transport in end of the roadmap MOSFETs device i...
International audienceThe quasi-ballistic nature of transport in end of the roadmap MOSFETs device i...
International audienceThe quasi-ballistic nature of transport in end of the roadmap MOSFETs device i...
International Conference on Simulation of Semiconductor Processes and Devices, Hakone, JAPAN, SEP 09...
International audienceWe present an analytical model for the subthreshold characteristic of ultra-th...
Abstract—The scattering effects are studied in nanometer-scaled double-gate MOSFET using Monte Carlo...
Today, the MOSFET transistor reaches decananometer dimensions for which the effects of ballistic tra...
International Conference on Simulation of Semiconductor Processes and Devices, Hakone, JAPAN, SEP 09...
International audienceIn this paper we present a compact model of Double-Gate MOSFET architecture in...
International audienceWe developed an original physics-based unified analytical model describing the...
In this paper, the ballistic and quasi-ballistic transport characteristics of Sub-30 nm double gate ...
International audienceA drift-diffusion-like formulation for including ballistic and quasi-ballistic...
International audienceA drift-diffusion-like formulation for including ballistic and quasi-ballistic...
International audienceA drift-diffusion-like formulation for including ballistic and quasi-ballistic...
International audienceThe quasi-ballistic nature of transport in end of the roadmap MOSFETs device i...
International audienceThe quasi-ballistic nature of transport in end of the roadmap MOSFETs device i...
International audienceThe quasi-ballistic nature of transport in end of the roadmap MOSFETs device i...
International audienceThe quasi-ballistic nature of transport in end of the roadmap MOSFETs device i...
International Conference on Simulation of Semiconductor Processes and Devices, Hakone, JAPAN, SEP 09...
International audienceWe present an analytical model for the subthreshold characteristic of ultra-th...
Abstract—The scattering effects are studied in nanometer-scaled double-gate MOSFET using Monte Carlo...
Today, the MOSFET transistor reaches decananometer dimensions for which the effects of ballistic tra...
International Conference on Simulation of Semiconductor Processes and Devices, Hakone, JAPAN, SEP 09...