Add to ORKG[[sponsorship]]應用科學研究中心[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0003-6951&DestApp=JCR&RQ=IF_CAT_BOXPLO
[[sponsorship]]原子與分子科學研究所[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway...
The period of a focal array is limited by the angular sampling and the f number of the system. This ...
Abstract— Two advanced microfabrication processes based on ultraviolet photolithography (UV LIGA) to...
[[sponsorship]]應用科學研究中心[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway/G...
介绍了一种新的近场光刻技术的基本原理及其在光刻方面的应用研究的最新进展。新技术的基本原理是：光远场照射，通过超分辨掩模产生光刻所需的超过衍射极限的近场光，利用夹在掩模和光刻胶中间的电介质保护层实现了近...
[[sponsorship]]應用科學研究中心[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway/G...
Developing a cost-effective nanolithography strategy that enables the production of subwavelength fe...
Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield...
Subwavelength gratings (SWG) are periodic structures that synthesize lithography tailorable metamate...
Developing a cost-effective nanolithography strategy that enables the production of subwavelength fe...
This thesis examines a series of near-field antenna arrays used to perform subwavelength focusing an...
[[sponsorship]]應用科學研究中心[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway/G...
[[sponsorship]]物理研究所[[note]]已出版;[SCI];有審查制度[[note]]http://gateway.isiknowledge.com/gateway/Gateway.c...
We propose a method of fabricating subwavelength structures based on multi-exposure surface plasmon ...
[[sponsorship]]應用科學研究中心[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway/G...
[[sponsorship]]原子與分子科學研究所[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway...
The period of a focal array is limited by the angular sampling and the f number of the system. This ...
Abstract— Two advanced microfabrication processes based on ultraviolet photolithography (UV LIGA) to...
[[sponsorship]]應用科學研究中心[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway/G...
介绍了一种新的近场光刻技术的基本原理及其在光刻方面的应用研究的最新进展。新技术的基本原理是：光远场照射，通过超分辨掩模产生光刻所需的超过衍射极限的近场光，利用夹在掩模和光刻胶中间的电介质保护层实现了近...
[[sponsorship]]應用科學研究中心[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway/G...
Developing a cost-effective nanolithography strategy that enables the production of subwavelength fe...
Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield...
Subwavelength gratings (SWG) are periodic structures that synthesize lithography tailorable metamate...
Developing a cost-effective nanolithography strategy that enables the production of subwavelength fe...
This thesis examines a series of near-field antenna arrays used to perform subwavelength focusing an...
[[sponsorship]]應用科學研究中心[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway/G...
[[sponsorship]]物理研究所[[note]]已出版;[SCI];有審查制度[[note]]http://gateway.isiknowledge.com/gateway/Gateway.c...
We propose a method of fabricating subwavelength structures based on multi-exposure surface plasmon ...
[[sponsorship]]應用科學研究中心[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway/G...
[[sponsorship]]原子與分子科學研究所[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway...
The period of a focal array is limited by the angular sampling and the f number of the system. This ...
Abstract— Two advanced microfabrication processes based on ultraviolet photolithography (UV LIGA) to...