none6siSelf-standing, 1-dimensional (1D) structures of p-Type metal oxide (MOx) have been the focus of considerable attention, due to their unique properties in energy storage and solar light conversion. However, the practical performance of p-Type MOx is intrinsically limited by their interfacial defects and strong charge recombination losses. Single crystalline assembly can significantly reduce recombination at interface and grain boundaries. Here, we present a one-step route based on plasma assisted physical vapor deposition (PVD), for the rational and scalable synthesis of single crystalline 1D vertically aligned Co3O4 tapered nanorods (NRs). The effect of PVD parameters (deposition pressure, temperature and duration) in tuning the morp...
Co3O4 thin films were grown on MgO(100) and MgAl2O4(100) by plasma enhanced-chemical vapor depositio...
Plasma processing represents an attractive and versatile option for the fabrication of lowdimensiona...
Cobalt oxide has been deposited with remote plasma ALD over a wide temperature window (100 - 400 °C)...
Self-standing, 1-dimensional (1D) structures of p-Type metal oxide (MOx) have been the focus of cons...
International audienceThe normal cubic spinel Co3O4 () is the most stable crystalline cobalt oxide a...
In this study, thin films of cobalt oxide (Co3O4) have been grown by the metal-organic chemical vapo...
The development of quasi-1D Co3O4/ZnO nanocomposites by a two-step plasma enhanced-chemical vapor de...
The development of quasi-1D Co3O4/ZnO nanocomposites by a two-step plasma enhanced-chemical vapor de...
The development of quasi-1D Co3O4/ZnO nanocomposites by a two-step plasma enhanced-chemical vapor de...
To develop high-performance nanostructured metal oxide electrodes, it is important to understand the...
Cobalt oxide thin films have been deposited with remote plasma atomic layer deposition (ALD) within ...
For p-type semiconductor nanoparticles, such as the cobalt oxide spinel, enhancing the nanoparticle ...
During the past decade, portable electronic devices have become considerably more complex and have f...
Fabrication of low-cost, uniform size, and binder-free nanomaterials via contact glow discharge elec...
Herein, this report uses Co3O4 nanoneedles to decorate Mo-Co3O4 nanosheets over Ni foam, which were ...
Co3O4 thin films were grown on MgO(100) and MgAl2O4(100) by plasma enhanced-chemical vapor depositio...
Plasma processing represents an attractive and versatile option for the fabrication of lowdimensiona...
Cobalt oxide has been deposited with remote plasma ALD over a wide temperature window (100 - 400 °C)...
Self-standing, 1-dimensional (1D) structures of p-Type metal oxide (MOx) have been the focus of cons...
International audienceThe normal cubic spinel Co3O4 () is the most stable crystalline cobalt oxide a...
In this study, thin films of cobalt oxide (Co3O4) have been grown by the metal-organic chemical vapo...
The development of quasi-1D Co3O4/ZnO nanocomposites by a two-step plasma enhanced-chemical vapor de...
The development of quasi-1D Co3O4/ZnO nanocomposites by a two-step plasma enhanced-chemical vapor de...
The development of quasi-1D Co3O4/ZnO nanocomposites by a two-step plasma enhanced-chemical vapor de...
To develop high-performance nanostructured metal oxide electrodes, it is important to understand the...
Cobalt oxide thin films have been deposited with remote plasma atomic layer deposition (ALD) within ...
For p-type semiconductor nanoparticles, such as the cobalt oxide spinel, enhancing the nanoparticle ...
During the past decade, portable electronic devices have become considerably more complex and have f...
Fabrication of low-cost, uniform size, and binder-free nanomaterials via contact glow discharge elec...
Herein, this report uses Co3O4 nanoneedles to decorate Mo-Co3O4 nanosheets over Ni foam, which were ...
Co3O4 thin films were grown on MgO(100) and MgAl2O4(100) by plasma enhanced-chemical vapor depositio...
Plasma processing represents an attractive and versatile option for the fabrication of lowdimensiona...
Cobalt oxide has been deposited with remote plasma ALD over a wide temperature window (100 - 400 °C)...