Alumina and aluminosilicates, prepared under various synthesis conditions, play a central role in heterogeneous catalysis with a broad range of industrial applications. We report herein the atomic-scale structure of alumina layers obtained by atomic layer deposition (ALD) of trimethylaluminum onto partially dehydroxylated silica. Such a detailed insight into the atomic structure of the species formed with increasing Al content was gained using a variety of one- and two-dimensional solid-state nuclear magnetic resonance (NMR) experiments involving 27Al, 1H, and 29Si nuclei. Multicomponent fittings of the 1D and 2D experimental data sets allowed us to show that at 3.4 wt % of deposited Al, a submonolayer containing [4]Al(3Si), [4]Al(4Si), and...
The initial growth during the atomic-layer deposition (ALD) of Al2O3 using trimethylaluminum (TMA) a...
Aluminum is an ideal metal for solution-processed oxide dielectrics because it can form polymerized ...
Atomic layer deposition (ALD) is a thin film deposition process based on alternating exposure of pre...
*S Supporting Information ABSTRACT: Despite the widespread use of amorphous aluminosilicates (ASA) i...
Despite the widespread use of amorphous aluminosilicates (ASA) in various industrial catalysts, the ...
A suite of amorphous silica-aluminas (ASAs) was prepared by homogeneous deposition–precipitation (HD...
International audienceThe atomic scale structure of aluminum in amorphous alumina films processed by...
Isotopic enrichment of 29Si and DNP-enhanced NMR spectroscopy are combined to determine the detailed...
International audienceThe determination of the nature and structure of surface sites after chemical ...
Using narrow nuclear reaction resonance profiling, aluminum profiles are obtained in ;3.5 nm Al2O3 f...
Despite their wide use in the oil refining process, little is known about the distribution of alumin...
The determination of the nature and structure of surface sites after chemical modification of large ...
Atomic layer deposition (ALD) is a novel and promising film deposition method for microelectronics a...
The atomic layer deposition of gallium and indium oxide was investigated on mesoporous silica powder...
Aluminum oxide (Al2O3) layers, prepared by atomic layer deposition (ALD), provide excellent surface ...
The initial growth during the atomic-layer deposition (ALD) of Al2O3 using trimethylaluminum (TMA) a...
Aluminum is an ideal metal for solution-processed oxide dielectrics because it can form polymerized ...
Atomic layer deposition (ALD) is a thin film deposition process based on alternating exposure of pre...
*S Supporting Information ABSTRACT: Despite the widespread use of amorphous aluminosilicates (ASA) i...
Despite the widespread use of amorphous aluminosilicates (ASA) in various industrial catalysts, the ...
A suite of amorphous silica-aluminas (ASAs) was prepared by homogeneous deposition–precipitation (HD...
International audienceThe atomic scale structure of aluminum in amorphous alumina films processed by...
Isotopic enrichment of 29Si and DNP-enhanced NMR spectroscopy are combined to determine the detailed...
International audienceThe determination of the nature and structure of surface sites after chemical ...
Using narrow nuclear reaction resonance profiling, aluminum profiles are obtained in ;3.5 nm Al2O3 f...
Despite their wide use in the oil refining process, little is known about the distribution of alumin...
The determination of the nature and structure of surface sites after chemical modification of large ...
Atomic layer deposition (ALD) is a novel and promising film deposition method for microelectronics a...
The atomic layer deposition of gallium and indium oxide was investigated on mesoporous silica powder...
Aluminum oxide (Al2O3) layers, prepared by atomic layer deposition (ALD), provide excellent surface ...
The initial growth during the atomic-layer deposition (ALD) of Al2O3 using trimethylaluminum (TMA) a...
Aluminum is an ideal metal for solution-processed oxide dielectrics because it can form polymerized ...
Atomic layer deposition (ALD) is a thin film deposition process based on alternating exposure of pre...