SiC Schottky detectors, having a superficial active zone up to 80 micron depths and a thin surface metallization, are adapt to detect high energetic ions. In order to demonstrate their detection ability with high-energy resolution, a helium Rutherford backscattering spectroscopy (RBS) was employed to evaluate their detection efficiency, energy resolution in the region 1.0 – 6.0 MeV alpha ions, depth resolution and dependence on the ion beam current. The detector parameters dependencies on the surface passivation layers, ion energy and current are presented. The comparison of RBS analysis using a traditional barrier silicon detector is investigated, and the differences with SiC detector is presented and discussed
The pulse height response for He and H ions with energies between 1 and 6 MeV incident upon n-type 4...
Rutherford Backscattering Spectrometry (RBS) is a very popular, fast, and non-destructive technique ...
We present a comprehensive review of the properties of the epitaxial 4H silicon carbide polytype (4H...
A 4H-SiC Schottky diode was investigated as a particle detector for Rutherford Backscat tering Spect...
Epitaxial SiC device have been tested as detector for Rutherford Backscattering Spec troscopy (RBS)....
SiC is a wide-gap material with excellent electrical and physical properties that may make it an imp...
Rutherford backscattering spectroscopy (RBS) and elastic recoil detection analysis (ERDA) with lithi...
High performance SiC detectors for ionising radiation have been designed, manufactured and tested. S...
Several new technologies have been introduced recently in the region of semiconductor material for s...
The properties of single crystals, thin films and their surfaces and interfaces have a critical impa...
We report on response of newly designed 4H-SiC Schottky barrier diode (SBD) detector to alpha, beta ...
Detectors based on Silicon and Silicon Carbide are employed to monitor and characterize different so...
The Rutherford backscattering spectroscopy (RBS) has been an important analytical method for determi...
We present a study on the high speed detection capability of Nickel/4H-SiC Schottky junctions for pr...
Heavy Ion Rutherford Backscattering Spectroscopy uses a beam of energetic ions to probe the composit...
The pulse height response for He and H ions with energies between 1 and 6 MeV incident upon n-type 4...
Rutherford Backscattering Spectrometry (RBS) is a very popular, fast, and non-destructive technique ...
We present a comprehensive review of the properties of the epitaxial 4H silicon carbide polytype (4H...
A 4H-SiC Schottky diode was investigated as a particle detector for Rutherford Backscat tering Spect...
Epitaxial SiC device have been tested as detector for Rutherford Backscattering Spec troscopy (RBS)....
SiC is a wide-gap material with excellent electrical and physical properties that may make it an imp...
Rutherford backscattering spectroscopy (RBS) and elastic recoil detection analysis (ERDA) with lithi...
High performance SiC detectors for ionising radiation have been designed, manufactured and tested. S...
Several new technologies have been introduced recently in the region of semiconductor material for s...
The properties of single crystals, thin films and their surfaces and interfaces have a critical impa...
We report on response of newly designed 4H-SiC Schottky barrier diode (SBD) detector to alpha, beta ...
Detectors based on Silicon and Silicon Carbide are employed to monitor and characterize different so...
The Rutherford backscattering spectroscopy (RBS) has been an important analytical method for determi...
We present a study on the high speed detection capability of Nickel/4H-SiC Schottky junctions for pr...
Heavy Ion Rutherford Backscattering Spectroscopy uses a beam of energetic ions to probe the composit...
The pulse height response for He and H ions with energies between 1 and 6 MeV incident upon n-type 4...
Rutherford Backscattering Spectrometry (RBS) is a very popular, fast, and non-destructive technique ...
We present a comprehensive review of the properties of the epitaxial 4H silicon carbide polytype (4H...