Highly integrated photonic crystal bandedge lasers monolithically grown on Si substrates

Monolithic integration of III-V lasers with small footprint, good coherence, and low power consumption based on a CMOS-compatible Si substrate have been known as an efficient route towards high-density optical interconnects in the photonic integrated circuits. However, the material dissimilarities between Si and III-V materials limit the performance of monolithic microlasers. Here, under the pumping condition of a continuous-wave 632.8 nm He–Ne gas laser at room temperature, we achieved an InAs/GaAs quantum dot photonic crystal bandedge laser, which is directly grown on an on-axis Si (001) substrate, which provides a feasible route towards a low-cost and large-scale integration method for light sources on the Si platform