International audienceX-ray diffraction and reflectometry allows the measurements of various parameters (thickness, porosity, roughness and strain) of thin layers of porous silicon. Measurements on n-type porous silicon layers of different doping give very different results: for lightly doped samples, the layer properties vary smoothly as a function of formation time, while for heavily doped samples several regimes are observed for short formation times. X-ray satellites have been observed in the X-ray reflexion or diffraction from holographic gratings
Reflection spectra of four porous silicon samples under etching times of 2, 6, 10, and 14 min with c...
The internal structure of p− and p+ doped porous silicon (PS) has been investigated by small-angle X...
Porous silicon (PS) layer was produced by photochemical etching process at (5, 7, 10, 12 and 15) etc...
International audienceHigh resolution x-ray diffraction has been used to study the effect of doping ...
In this paper, we describe a nondestructive method based onx-ray reflectivity for measuring the thic...
International audienceX-ray reflectivity is used to study the mesoscopic structure of porous silicon...
X-ray reflectivity (XRR) was used to investigate the p- and p+ -type porous Silicon (PS) layers. For...
Porous silicon (PS) layers formed by anodization on polished and textured substrates of (100) Si at ...
The presently studied substrates for manufacturing freestanding silicon epitaxial layers contained t...
The differences of properties for both single-layered and multi-layered porous silicon were investig...
Abstract—Porous silicon offers remarkable optical properties which have a wide range of applications...
X-ray double-crystal diffractometry was used to measure lattice deformation of porous silicon (PS) a...
AbstractImplementing an annealed porous silicon Bragg reflector between a crystalline silicon thin-f...
Studies of the depth profile of Porous Silicon (PS) structures etched under a wide span of different...
Porous silicon (PS) layers come into existance as a result of electrochemical anodization on silic...
Reflection spectra of four porous silicon samples under etching times of 2, 6, 10, and 14 min with c...
The internal structure of p− and p+ doped porous silicon (PS) has been investigated by small-angle X...
Porous silicon (PS) layer was produced by photochemical etching process at (5, 7, 10, 12 and 15) etc...
International audienceHigh resolution x-ray diffraction has been used to study the effect of doping ...
In this paper, we describe a nondestructive method based onx-ray reflectivity for measuring the thic...
International audienceX-ray reflectivity is used to study the mesoscopic structure of porous silicon...
X-ray reflectivity (XRR) was used to investigate the p- and p+ -type porous Silicon (PS) layers. For...
Porous silicon (PS) layers formed by anodization on polished and textured substrates of (100) Si at ...
The presently studied substrates for manufacturing freestanding silicon epitaxial layers contained t...
The differences of properties for both single-layered and multi-layered porous silicon were investig...
Abstract—Porous silicon offers remarkable optical properties which have a wide range of applications...
X-ray double-crystal diffractometry was used to measure lattice deformation of porous silicon (PS) a...
AbstractImplementing an annealed porous silicon Bragg reflector between a crystalline silicon thin-f...
Studies of the depth profile of Porous Silicon (PS) structures etched under a wide span of different...
Porous silicon (PS) layers come into existance as a result of electrochemical anodization on silic...
Reflection spectra of four porous silicon samples under etching times of 2, 6, 10, and 14 min with c...
The internal structure of p− and p+ doped porous silicon (PS) has been investigated by small-angle X...
Porous silicon (PS) layer was produced by photochemical etching process at (5, 7, 10, 12 and 15) etc...