An analysis of dynamic roughening and smoothening mechanisms of thin films grown with pulsed-dc magnetron sputtering is presented. The roughness evolution has been described by a linear stochastic equation, which contains the second- and fourth-order gradient terms. Dynamic smoothening of the growing interface is explained by ballistic effects resulting from impingements of ions to the growing thin film. These ballistic effects are sensitive to the flux and energy of impinging ions. The predictions of the model are compared with experimental data, and it is concluded that the thin film roughness can be further controlled by adjusting waveform, frequency, and width of dc pulses
This paper reports several new findings on the breakdown of dynamic roughening in thin film growth. ...
This paper reports several new findings on the breakdown of dynamic roughening in thin film growth. ...
Interface roughness and dynamic growth behavior of TiC/a-C nanocomposite films deposited by pulsed-D...
An analysis of dynamic roughening and smoothening mechanisms of thin films grown with pulsed-dc magn...
An analysis of dynamic roughening and smoothening mechanisms of thin films grown with pulsed-dc magn...
An analysis of dynamic roughening and smoothening mechanisms of thin films grown with pulsed-dc magn...
An analysis of dynamic roughening and smoothening mechanisms of thin films grown with pulsed-dc magn...
Surface roughness and dynamic growth behavior of TiC/a-C nanocomposite films deposited by nonreactiv...
Surface roughness and dynamic growth behavior of TiC/a-C nanocomposite films deposited by nonreactiv...
Dynamic roughening is a common phenomenon observed in plasma processing of materials, including both...
Dynamic roughening is a common phenomenon observed in plasma processing of materials, including both...
Dynamic roughening is a common phenomenon observed in plasma processing of materials, including both...
Dynamic roughening is a common phenomenon observed in plasma processing of materials, including both...
Dynamic roughening is a common phenomenon observed in plasma processing of materials, including both...
This paper reports several new findings on the breakdown of dynamic roughening in thin film growth. ...
This paper reports several new findings on the breakdown of dynamic roughening in thin film growth. ...
This paper reports several new findings on the breakdown of dynamic roughening in thin film growth. ...
Interface roughness and dynamic growth behavior of TiC/a-C nanocomposite films deposited by pulsed-D...
An analysis of dynamic roughening and smoothening mechanisms of thin films grown with pulsed-dc magn...
An analysis of dynamic roughening and smoothening mechanisms of thin films grown with pulsed-dc magn...
An analysis of dynamic roughening and smoothening mechanisms of thin films grown with pulsed-dc magn...
An analysis of dynamic roughening and smoothening mechanisms of thin films grown with pulsed-dc magn...
Surface roughness and dynamic growth behavior of TiC/a-C nanocomposite films deposited by nonreactiv...
Surface roughness and dynamic growth behavior of TiC/a-C nanocomposite films deposited by nonreactiv...
Dynamic roughening is a common phenomenon observed in plasma processing of materials, including both...
Dynamic roughening is a common phenomenon observed in plasma processing of materials, including both...
Dynamic roughening is a common phenomenon observed in plasma processing of materials, including both...
Dynamic roughening is a common phenomenon observed in plasma processing of materials, including both...
Dynamic roughening is a common phenomenon observed in plasma processing of materials, including both...
This paper reports several new findings on the breakdown of dynamic roughening in thin film growth. ...
This paper reports several new findings on the breakdown of dynamic roughening in thin film growth. ...
This paper reports several new findings on the breakdown of dynamic roughening in thin film growth. ...
Interface roughness and dynamic growth behavior of TiC/a-C nanocomposite films deposited by pulsed-D...