Sub-micrometer features are replicated into high-molecular-weight polymer resists by using solvent-assisted nanoimprint lithography (see figure). By swelling the polymer in a controlled solvent-vapor atmosphere, millibar pressures and ambient temperatures are sufficient to achieve high-fidelity replication.</p
We report a simple yet robust and reproducible technique to create surface patterns with submicromet...
Simultaneous imprinting on two length scales (nanometer and ångström) delivers highly specific molec...
We report a simple yet robust and reproducible technique to create surface patterns with submicromet...
Sub-micrometer features are replicated into high-molecular-weight polymer resists by using solvent-a...
We have demonstrated multi-step room-temperature nanoimprint lithography (RTNIL) using polystyrene (...
Soft nanoimprint lithography (soft NIL) relies on a mechanical deformation of a resist by a patterne...
This dissertation begins by presenting the use of inorganic copolymer imprint resists, namely siloxa...
Abstract—This paper examines aspects of a soft nanoimprint lithography technique for operation at re...
In this work, the authors present and demonstrate a simple method to fabricate and mass replicate re...
In this work we describe a new method suitable for large area nanoimprint lithography. In step&s...
International audienceIn conventional nanoimprint lithography, relatively high pressures and high te...
Soft UV-imprint lithography at sub-micron dimensions was achieved in thin films of photopolymer resi...
We demonstrate that room-temperature and low-pressure nanoimprint lithography techniques can be achi...
The use of durable replica molds with high feature resolution has been proposed as an inexpensive an...
We fabricated features down to 50 nm by UV step and stamp imprint lithography (UV-SSIL). This method...
We report a simple yet robust and reproducible technique to create surface patterns with submicromet...
Simultaneous imprinting on two length scales (nanometer and ångström) delivers highly specific molec...
We report a simple yet robust and reproducible technique to create surface patterns with submicromet...
Sub-micrometer features are replicated into high-molecular-weight polymer resists by using solvent-a...
We have demonstrated multi-step room-temperature nanoimprint lithography (RTNIL) using polystyrene (...
Soft nanoimprint lithography (soft NIL) relies on a mechanical deformation of a resist by a patterne...
This dissertation begins by presenting the use of inorganic copolymer imprint resists, namely siloxa...
Abstract—This paper examines aspects of a soft nanoimprint lithography technique for operation at re...
In this work, the authors present and demonstrate a simple method to fabricate and mass replicate re...
In this work we describe a new method suitable for large area nanoimprint lithography. In step&s...
International audienceIn conventional nanoimprint lithography, relatively high pressures and high te...
Soft UV-imprint lithography at sub-micron dimensions was achieved in thin films of photopolymer resi...
We demonstrate that room-temperature and low-pressure nanoimprint lithography techniques can be achi...
The use of durable replica molds with high feature resolution has been proposed as an inexpensive an...
We fabricated features down to 50 nm by UV step and stamp imprint lithography (UV-SSIL). This method...
We report a simple yet robust and reproducible technique to create surface patterns with submicromet...
Simultaneous imprinting on two length scales (nanometer and ångström) delivers highly specific molec...
We report a simple yet robust and reproducible technique to create surface patterns with submicromet...
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