We discuss the properties of the nonlinear diffusion equation for the case of diffusion in excited systems. The diffusion coefficient is directly proportional to the concentration of impurities and depends on time in a special way. For the description of the excited systems, we used a special temperature function, which defined the time dependent diffusion coefficient and the Boltzmann distribution of the excited vacancies or impurity atoms in solids. This model was used for the approximation of indium concentration profiles in HgCdTe of a rapid diffusion component and very fast diffusion of metastable vacancies irradiated by soft X-rays in an excited Si crystal
The phenomenological formalism, which yields Fick's Laws for diffusion in single phase multicomponen...
Dopant diffusion in semiconductors is an interestingphenomenon from both technological and scientifi...
Diffusion in crystalline solids includes processes such as lattice diffusion, surface diffusion, gra...
We discuss the properties of the nonlinear diffusion equation for the case of diffusion in excited ...
We considered the practically interesting, very fast nonlinear diffusion of metastable vacancies in ...
SIGLEAvailable from British Library Document Supply Centre- DSC:D85424 / BLDSC - British Library Doc...
Diffusion is the most fundamental mass transport process in solids characterized by point defect-dif...
We analyzed a diffusion model based on the assumption that the sufficient condition for the mass flu...
Ces travaux de thèse ont développé l’ensemble des problématiques de diffusion liées à la fabrication...
Silicon technology is based on doping with atoms from the groups III and V of the periodic system, w...
The paper deals with considerations on nonlinear therm odiffusion. The general scheme of a physical ...
Two sets of diffusion-reaction numerical simulations using a finite difference method ...
We considered the reasons of superdiffusivity and measured profiles of boron and phosphorus in cryst...
We study via first-principles calculations the energetics and diffusion of Ga in c-Si. In contrast t...
In the past a substantial amount of work has been carried out on tracer diffusion in metals and sev...
The phenomenological formalism, which yields Fick's Laws for diffusion in single phase multicomponen...
Dopant diffusion in semiconductors is an interestingphenomenon from both technological and scientifi...
Diffusion in crystalline solids includes processes such as lattice diffusion, surface diffusion, gra...
We discuss the properties of the nonlinear diffusion equation for the case of diffusion in excited ...
We considered the practically interesting, very fast nonlinear diffusion of metastable vacancies in ...
SIGLEAvailable from British Library Document Supply Centre- DSC:D85424 / BLDSC - British Library Doc...
Diffusion is the most fundamental mass transport process in solids characterized by point defect-dif...
We analyzed a diffusion model based on the assumption that the sufficient condition for the mass flu...
Ces travaux de thèse ont développé l’ensemble des problématiques de diffusion liées à la fabrication...
Silicon technology is based on doping with atoms from the groups III and V of the periodic system, w...
The paper deals with considerations on nonlinear therm odiffusion. The general scheme of a physical ...
Two sets of diffusion-reaction numerical simulations using a finite difference method ...
We considered the reasons of superdiffusivity and measured profiles of boron and phosphorus in cryst...
We study via first-principles calculations the energetics and diffusion of Ga in c-Si. In contrast t...
In the past a substantial amount of work has been carried out on tracer diffusion in metals and sev...
The phenomenological formalism, which yields Fick's Laws for diffusion in single phase multicomponen...
Dopant diffusion in semiconductors is an interestingphenomenon from both technological and scientifi...
Diffusion in crystalline solids includes processes such as lattice diffusion, surface diffusion, gra...