We studied epitaxial growth conditions of II-VI semiconductors on (110) substrates, which is indispensable for fabrication of T-shaped quantum wire structures. We experimented with different types of (110)-oriented substrates and monitored the surface quality of deposited layers in situ by reflection high energy electron diffraction and ex situ by photoluminescence. The aim of this work is to find optimum growth conditions of II-VI compounds on a cleaved edge of a superlattice as required by the overgrowth method
We have investigated the growth of GaAs nanowires as a function of temperatures and source pressures...
Recent progress in computational materials science in the area of semiconductor epitaxial growth is ...
Semiconducting nanowires are emerging as a route to combine heavily mismatched materials. The high l...
Corrugated CdZnTe substrates and quantum wires fabricated by dry etching techniques from (CdTe)/(MnT...
Selective area growth on silicon dioxide masked gallium arsenide substrates by chemical beam epitaxy...
Chemical beam epitaxy was used to grow GaAs and InP based heterostructures on selectively masked sub...
The mechanism of the cross-sectional evolution during the selective growth of GaAs quantum wires (QW...
We review a new molecular beam epitaxy (MBE) technique we call cleaved edge overgrowth (CEO), which ...
We report on the evolution of the growth front during molecular-beam epitaxy on GaAs (3 1 1)A substr...
AbstractSelf-assembled quantum structures have been successfully grown for some time now but control...
The selected area epitaxial overgrowth of narrow gap HgTe as well as wide gap CdTe and ZnTe on CdTe/...
Improved understanding and control of compositional modulations in epitaxial III-V alloys can result...
The growth mode and structure of metal overlayers, stabilised by molecular beam epitaxy, on oriented...
Using a novel growth mechanism on patterned high-index GaAs (311)A substrates we have developed a ne...
Semiconducting nanowires are emerging as a route to combine heavily mismatched materials. The high l...
We have investigated the growth of GaAs nanowires as a function of temperatures and source pressures...
Recent progress in computational materials science in the area of semiconductor epitaxial growth is ...
Semiconducting nanowires are emerging as a route to combine heavily mismatched materials. The high l...
Corrugated CdZnTe substrates and quantum wires fabricated by dry etching techniques from (CdTe)/(MnT...
Selective area growth on silicon dioxide masked gallium arsenide substrates by chemical beam epitaxy...
Chemical beam epitaxy was used to grow GaAs and InP based heterostructures on selectively masked sub...
The mechanism of the cross-sectional evolution during the selective growth of GaAs quantum wires (QW...
We review a new molecular beam epitaxy (MBE) technique we call cleaved edge overgrowth (CEO), which ...
We report on the evolution of the growth front during molecular-beam epitaxy on GaAs (3 1 1)A substr...
AbstractSelf-assembled quantum structures have been successfully grown for some time now but control...
The selected area epitaxial overgrowth of narrow gap HgTe as well as wide gap CdTe and ZnTe on CdTe/...
Improved understanding and control of compositional modulations in epitaxial III-V alloys can result...
The growth mode and structure of metal overlayers, stabilised by molecular beam epitaxy, on oriented...
Using a novel growth mechanism on patterned high-index GaAs (311)A substrates we have developed a ne...
Semiconducting nanowires are emerging as a route to combine heavily mismatched materials. The high l...
We have investigated the growth of GaAs nanowires as a function of temperatures and source pressures...
Recent progress in computational materials science in the area of semiconductor epitaxial growth is ...
Semiconducting nanowires are emerging as a route to combine heavily mismatched materials. The high l...