The resistivity (ρ) and temperature coefficient of resistivity (TCR) dependencies on modulation wavelength (λ) were examined in Fe/Zr multi-layer thin films. It was shown that the ρ(λ) and TCR(λ) behaviours can be explained on the basis of the assumption that the amorphous phase can be spontaneously formed during the deposition process. We found that the effective thickness of the amorphous phase was ≈2 nm per single interface
The electrical resistivity of sputter-deposited Cu/V multilayer films with different individual laye...
Multilayers of Fee0.33Zr0.67, prepared by electron beam evaporation, have been characterized by conv...
The results of electrical resistivity ρ(T) measurements on Fe-rich Fe-Zr glasses in a wide temp...
In this paper we report results of investigation into structure and magnetic properties of as-deposi...
The electrical resistivity and temperature coefficient of resistivity (TCR) of thin films and multil...
The formation of amorphous structure of Fe thin films by magnetron co-sputtering deposition dependen...
Thickness- and concentration-dependent crystal-to-amorphous transition of Fe100-xZrx in Zr/Fe100-xZr...
We report our ferromagnetic resonance measurements for three series of Fe/Zr multilayers with thickn...
We calculate the electric conductivity and the temperature coefficient of resistance (TCR) of a mult...
By using electron beam gun and thermal deposition techniques in the vacuum range 6 x10-5mbar. The pu...
The temperature coefficients of the resistivity (TCR) of Cu, Ru, Co, Ir, and W thin films have been ...
The high density of interfaces which occurs in metallic multilayers with very small modulation lengt...
Vapor-deposited Zr-Fe multilayered thin films with various wavelengths and of overall composition ei...
Multilayered Zr - Fe films of average composition Zr50Fe50 were prepared by sputtering. The samples ...
Exact and asymptotic expressions for the specific conductivity and the temperature coefficient of ...
The electrical resistivity of sputter-deposited Cu/V multilayer films with different individual laye...
Multilayers of Fee0.33Zr0.67, prepared by electron beam evaporation, have been characterized by conv...
The results of electrical resistivity ρ(T) measurements on Fe-rich Fe-Zr glasses in a wide temp...
In this paper we report results of investigation into structure and magnetic properties of as-deposi...
The electrical resistivity and temperature coefficient of resistivity (TCR) of thin films and multil...
The formation of amorphous structure of Fe thin films by magnetron co-sputtering deposition dependen...
Thickness- and concentration-dependent crystal-to-amorphous transition of Fe100-xZrx in Zr/Fe100-xZr...
We report our ferromagnetic resonance measurements for three series of Fe/Zr multilayers with thickn...
We calculate the electric conductivity and the temperature coefficient of resistance (TCR) of a mult...
By using electron beam gun and thermal deposition techniques in the vacuum range 6 x10-5mbar. The pu...
The temperature coefficients of the resistivity (TCR) of Cu, Ru, Co, Ir, and W thin films have been ...
The high density of interfaces which occurs in metallic multilayers with very small modulation lengt...
Vapor-deposited Zr-Fe multilayered thin films with various wavelengths and of overall composition ei...
Multilayered Zr - Fe films of average composition Zr50Fe50 were prepared by sputtering. The samples ...
Exact and asymptotic expressions for the specific conductivity and the temperature coefficient of ...
The electrical resistivity of sputter-deposited Cu/V multilayer films with different individual laye...
Multilayers of Fee0.33Zr0.67, prepared by electron beam evaporation, have been characterized by conv...
The results of electrical resistivity ρ(T) measurements on Fe-rich Fe-Zr glasses in a wide temp...