Mo Be multilayers are promising optical elements for extreme ultraviolet EUV lithography and space optics. Experimentally derived optical constants are necessary for accurate and reliable design of beryllium containing optical coatings. We report optical constants of beryllium derived from synchrotron radiation based reflectivity data of Mo Be multilayers. Results are in good agreement with available data in the literature obtained from the well known absorption measurements of beryllium thin films or foils. We demonstrate synchrotron based at wavelength reflectometry as an accurate and non destructive technique for deriving EUV optical constants for materials that are difficult or unstable to make thin foils for absorption measurement
A characterization procedures to test multilayers in the EUV and soft X-Ray wavelengths are theoreti...
The development of microelectronics is always driven by reducing transistor size and increasing inte...
The development of microelectronics is always driven by reducing transistor size and increasing inte...
Mo Be multilayers are promising optical elements for extreme ultraviolet EUV lithography and space...
Mo Be multilayers are promising optical elements for extreme ultraviolet EUV lithography and space...
Beryllium (Be) has been recently receiving considerable attention as the key material for a range of...
The performance of beryllium-based multilayer coatings designed to reflect light of wavelengths near...
The response of a given material to an incident electromagnetic wave is described by the energy depe...
This paper presents the first results of systematic studies of beryllium as a material for multilaye...
This paper presents the first results of systematic studies of beryllium as a material for multilaye...
This paper presents the first results of systematic studies of beryllium as a material for multilaye...
International audienceAbstract The knowledge of optical properties of beryllium is of crucial import...
The determination of fundamental optical parameters is essential for the development of new optical ...
This thesis addresses research works on the development and metrology of multilayer thin-film coatin...
This thesis addresses research works on the development and metrology of multilayer thin-film coatin...
A characterization procedures to test multilayers in the EUV and soft X-Ray wavelengths are theoreti...
The development of microelectronics is always driven by reducing transistor size and increasing inte...
The development of microelectronics is always driven by reducing transistor size and increasing inte...
Mo Be multilayers are promising optical elements for extreme ultraviolet EUV lithography and space...
Mo Be multilayers are promising optical elements for extreme ultraviolet EUV lithography and space...
Beryllium (Be) has been recently receiving considerable attention as the key material for a range of...
The performance of beryllium-based multilayer coatings designed to reflect light of wavelengths near...
The response of a given material to an incident electromagnetic wave is described by the energy depe...
This paper presents the first results of systematic studies of beryllium as a material for multilaye...
This paper presents the first results of systematic studies of beryllium as a material for multilaye...
This paper presents the first results of systematic studies of beryllium as a material for multilaye...
International audienceAbstract The knowledge of optical properties of beryllium is of crucial import...
The determination of fundamental optical parameters is essential for the development of new optical ...
This thesis addresses research works on the development and metrology of multilayer thin-film coatin...
This thesis addresses research works on the development and metrology of multilayer thin-film coatin...
A characterization procedures to test multilayers in the EUV and soft X-Ray wavelengths are theoreti...
The development of microelectronics is always driven by reducing transistor size and increasing inte...
The development of microelectronics is always driven by reducing transistor size and increasing inte...