Chemical analysis of H2/CH4 and H2/CH4/B2H6 high pressure-high power microwave plasma using TDLAS and OES techniques

Diagnostics spectroscopiques d'espèces carbonées et modélisation physico-chimique de plasmas micro-ondes dans les mélanges H2/CH4 et Ar/H2/CH4 utilisés pour le dépôt de diamant

Lombardi, Guillaume

November 2003

A. Gicquel (Examinatrice, Pr. Université Paris XIII) K. Hassouni (Examinateur, CR CNRS LIMHP, HDR) J...

Optoelectronic monitoring of plasma discharge optimized for thin diamond film synthesis

R. Bogdanowicz
M. Gnyba
P. Wroczyński

January 2006

We used Optical Emission Spectroscopy (OES) as a non-invasive optoelectronic tool of in-situ monitor...

Spectroscopic determination of C{sub 2} in Ar/H{sub 2}/CH{sub 4} and Ar/H{sub 2}/C{sub 60} microwave plasmas for nanocrystalline diamond synthesis.

Goyette, A. N.
Lawler, J. E.
Anderson, L. W.
Gruen, D. M.
McCauley, T. G.
Zhou, D.
Krauss, A. R.

February 1998

We have measured the steady state concentration of gas phase C{sub 2} in Ar/H{sub 2}/CH{sub 4} and A...

Chemical analysis of H2/CH4 and H2/CH4/B2H6 high pressure-high power microwave plasma using TDLAS and OES techniques

Rond, C.
Hamann, S.
Wartel, M.
Lombardi, G.
Gicquel, A.
Röpcke, J.

June 2014

oralInternational audienceMicrowave H2/CH4 and H2/CH4/B2H6 plasmas used for diamond deposition have ...

Spectroscopic study of H2 microwave plasmas with small admixtures of CH4 and B2H6 used for doped diamond deposition

Hamann, S.
Rond, C.
Pipa, A. V.
Wartel, M.
Lombardi, G.
Gicquel, A.
Röpcke, J.

July 2014

International audienceMicrowave (MW) H2 plasmas with small admixtures of CH4 and/or B2H6 used for do...

Investigation of H2/CH4 and H2/CH4/B2H6 high pressure-high power microwave plasma chemistry using IR-TDLAS

Rond, C.
Hamann, S.
Wartel, M.
Lombardi, G.
Hassouni, K.
Gicquel, A.
Röpcke, J.

July 2014

International audienceInfrared tunable diode laser absorption spectroscopy (IR TDLAS) technique [1,2...

Chemical study of H2/CH4 and H2/CH4/B2H6 microwave plasmas at high pressure/power by TDLAS measurements

Rond, C.
Hamann, S.
Wartel, M.
Lombardi, G.
Gicquel, A.
Röpcke, J.

July 2014

posterInfrared tunable diode laser absorption spectroscopy (IR TDLAS) technique [1,2] has been imple...

Molecular beam mass spectrometry analysis of gaseous species responsible for diamond deposition in microwave plasmas

O. Aubry
J.-L. Delfau
C. Met
M.I. De Barros
L. Vandenbulcke
C. Vovelle

January 2002

This work aimed to the identification of the principal gaseous species involved in microwave plasmaa...

Detection of Hydrogen Atoms by Two Photons Absorption Laser Induced Fluorescence in a High Power Density H2/CH4 Microwave Plasma

Wartel, M.
Rond, C.
Derkaoui, N.
Duluard, C.
Gicquel, A.

April 2013

posterInternational audienceMicrowave Plasma Assisted Chemical Vapour Deposition (MPACVD) is widely ...

Fundamental studies of diamond chemical vapour deposition : plasma diagnostics and computer modelling

Richley, James Christopher

January 2011

This thesis reports experimental studies of the gas-phase chemistry within microwave plasma en- hanc...

Quantum cascade laser investigations of CH4 and C2H2 interconversion in hydrocarbon/H2 gas mixtures during microwave plasma enhanced chemical vapor deposition of diamond

Ma, J.
Cheesman, A.
Ashfold, M.N.R.
Hay, K.G.
Wright, S.
Langford, N.
Duxbury, G.
Mankelevich, Y.A.

August 2009

CH4 and C2H2 molecules (and their interconversion) in hydrocarbon/rare gas/H2 gas mixtures in a micr...

TDLAS for a diagnostic of dilute molecular species in a H(2)O/CH(3)OH diamond RF CVD system

Kim, Suchan

January 1997

Second-harmonic tunable diode laser absorption spectroscopy (TDLAS) is one of the most sensitive tec...

Application of a quantum cascade laser for time-resolved, in situ probing of CH4/H2 and C2H2/H2 gas mixtures during microwave plasma enhanced chemical vapor deposition of diamond

Cheesman, A.
Smith, J.A.
Ashfold, M.N.R.
Langford, N.
Wright, S.
Duxbury, G.

March 2006

First illustrations of the utility of pulsed quantum cascade lasers for in situ probing of the chemi...

Molecular beam mass spectrometry investigations of low temperature diamond growth using CO CH plasmas2 4

J. Petherbridge
P. W. May
S. R. J. Pearce
K. N. Rosser
M. N. R. Ashfold

December 2014

Diamond films have been successfully deposited at substrate temperatures as low as 435C using CO CH ...

Effect of CH/C 2 Species Density on Surface Morphology of Diamond Film Grown by Microwave Plasma Jet Chemical Vapor Deposition

Chun-Hsi Su
Ching-Yu Chang

May 2020

The present research employs in-situ plasma Optical Emission Spectroscopy (OES) to explore the effec...

Diagnostics spectroscopiques d'espèces carbonées et modélisation physico-chimique de plasmas micro-ondes dans les mélanges H2/CH4 et Ar/H2/CH4 utilisés pour le dépôt de diamant

Lombardi, Guillaume

November 2003

A. Gicquel (Examinatrice, Pr. Université Paris XIII) K. Hassouni (Examinateur, CR CNRS LIMHP, HDR) J...

Optoelectronic monitoring of plasma discharge optimized for thin diamond film synthesis

R. Bogdanowicz
M. Gnyba
P. Wroczyński

January 2006

We used Optical Emission Spectroscopy (OES) as a non-invasive optoelectronic tool of in-situ monitor...

Spectroscopic determination of C{sub 2} in Ar/H{sub 2}/CH{sub 4} and Ar/H{sub 2}/C{sub 60} microwave plasmas for nanocrystalline diamond synthesis.

Goyette, A. N.
Lawler, J. E.
Anderson, L. W.
Gruen, D. M.
McCauley, T. G.
Zhou, D.
Krauss, A. R.

February 1998

We have measured the steady state concentration of gas phase C{sub 2} in Ar/H{sub 2}/CH{sub 4} and A...

Chemical analysis of H2/CH4 and H2/CH4/B2H6 high pressure-high power microwave plasma using TDLAS and OES techniques

Rond, C.
Hamann, S.
Wartel, M.
Lombardi, G.
Gicquel, A.
Röpcke, J.

June 2014

oralInternational audienceMicrowave H2/CH4 and H2/CH4/B2H6 plasmas used for diamond deposition have ...

Spectroscopic study of H2 microwave plasmas with small admixtures of CH4 and B2H6 used for doped diamond deposition

Hamann, S.
Rond, C.
Pipa, A. V.
Wartel, M.
Lombardi, G.
Gicquel, A.
Röpcke, J.

July 2014

International audienceMicrowave (MW) H2 plasmas with small admixtures of CH4 and/or B2H6 used for do...

Investigation of H2/CH4 and H2/CH4/B2H6 high pressure-high power microwave plasma chemistry using IR-TDLAS

Rond, C.
Hamann, S.
Wartel, M.
Lombardi, G.
Hassouni, K.
Gicquel, A.
Röpcke, J.

July 2014

International audienceInfrared tunable diode laser absorption spectroscopy (IR TDLAS) technique [1,2...

Chemical study of H2/CH4 and H2/CH4/B2H6 microwave plasmas at high pressure/power by TDLAS measurements

Rond, C.
Hamann, S.
Wartel, M.
Lombardi, G.
Gicquel, A.
Röpcke, J.

July 2014

posterInfrared tunable diode laser absorption spectroscopy (IR TDLAS) technique [1,2] has been imple...

Molecular beam mass spectrometry analysis of gaseous species responsible for diamond deposition in microwave plasmas

O. Aubry
J.-L. Delfau
C. Met
M.I. De Barros
L. Vandenbulcke
C. Vovelle

January 2002

This work aimed to the identification of the principal gaseous species involved in microwave plasmaa...

Detection of Hydrogen Atoms by Two Photons Absorption Laser Induced Fluorescence in a High Power Density H2/CH4 Microwave Plasma

Wartel, M.
Rond, C.
Derkaoui, N.
Duluard, C.
Gicquel, A.

April 2013

posterInternational audienceMicrowave Plasma Assisted Chemical Vapour Deposition (MPACVD) is widely ...

Fundamental studies of diamond chemical vapour deposition : plasma diagnostics and computer modelling

Richley, James Christopher

January 2011

This thesis reports experimental studies of the gas-phase chemistry within microwave plasma en- hanc...

Quantum cascade laser investigations of CH4 and C2H2 interconversion in hydrocarbon/H2 gas mixtures during microwave plasma enhanced chemical vapor deposition of diamond

Ma, J.
Cheesman, A.
Ashfold, M.N.R.
Hay, K.G.
Wright, S.
Langford, N.
Duxbury, G.
Mankelevich, Y.A.

August 2009

CH4 and C2H2 molecules (and their interconversion) in hydrocarbon/rare gas/H2 gas mixtures in a micr...

TDLAS for a diagnostic of dilute molecular species in a H(2)O/CH(3)OH diamond RF CVD system

Kim, Suchan

January 1997

Second-harmonic tunable diode laser absorption spectroscopy (TDLAS) is one of the most sensitive tec...

Application of a quantum cascade laser for time-resolved, in situ probing of CH4/H2 and C2H2/H2 gas mixtures during microwave plasma enhanced chemical vapor deposition of diamond

Cheesman, A.
Smith, J.A.
Ashfold, M.N.R.
Langford, N.
Wright, S.
Duxbury, G.

March 2006

First illustrations of the utility of pulsed quantum cascade lasers for in situ probing of the chemi...

Molecular beam mass spectrometry investigations of low temperature diamond growth using CO CH plasmas2 4

J. Petherbridge
P. W. May
S. R. J. Pearce
K. N. Rosser
M. N. R. Ashfold

December 2014

Diamond films have been successfully deposited at substrate temperatures as low as 435C using CO CH ...

Effect of CH/C 2 Species Density on Surface Morphology of Diamond Film Grown by Microwave Plasma Jet Chemical Vapor Deposition

Chun-Hsi Su
Ching-Yu Chang

May 2020

The present research employs in-situ plasma Optical Emission Spectroscopy (OES) to explore the effec...

Diagnostics spectroscopiques d'espèces carbonées et modélisation physico-chimique de plasmas micro-ondes dans les mélanges H2/CH4 et Ar/H2/CH4 utilisés pour le dépôt de diamant

Lombardi, Guillaume

November 2003

A. Gicquel (Examinatrice, Pr. Université Paris XIII) K. Hassouni (Examinateur, CR CNRS LIMHP, HDR) J...

Optoelectronic monitoring of plasma discharge optimized for thin diamond film synthesis

R. Bogdanowicz
M. Gnyba
P. Wroczyński

January 2006

We used Optical Emission Spectroscopy (OES) as a non-invasive optoelectronic tool of in-situ monitor...

Spectroscopic determination of C{sub 2} in Ar/H{sub 2}/CH{sub 4} and Ar/H{sub 2}/C{sub 60} microwave plasmas for nanocrystalline diamond synthesis.

Goyette, A. N.
Lawler, J. E.
Anderson, L. W.
Gruen, D. M.
McCauley, T. G.
Zhou, D.
Krauss, A. R.

February 1998

We have measured the steady state concentration of gas phase C{sub 2} in Ar/H{sub 2}/CH{sub 4} and A...

Chemical analysis of H2/CH4 and H2/CH4/B2H6 high pressure-high power microwave plasma using TDLAS and OES techniques

Abstract

Extracted data

Chemical analysis of H2/CH4 and H2/CH4/B2H6 high pressure-high power microwave plasma using TDLAS and OES techniques

Abstract

Extracted data

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