Zirconia- and hafnia-based thin films have attracted tremendous attention in the past decade because of their unexpected ferroelectric behavior at the nanoscale, which enables the downscaling of ferroelectric devices. The present work reports an unprecedented ferroelectric rhombohedral phase of ZrO2 that can be achieved in thin films grown directly on (111)-Nb:SrTiO3 substrates by ion-beam sputtering. Structural and ferroelectric characterizations reveal (111)-oriented ZrO2 films under epitaxial compressive strain exhibiting switchable ferroelectric polarization of about 20.2 μC/cm2 with a coercive field of 1.5 MV/cm. Moreover, the time-dependent polarization reversal characteristics of Nb:SrTiO3/ZrO2/Au film capacitors exhibit typical bell...
The transition metal oxides ZrO2 and HfO2 as well as their solid solution are widely researched and,...
A new approach for the stabilization of the ferroelectric orthorhombic ZrO2 films is demonstrated th...
This thesis reports a new polar r-phase, with large polarization and robustness. According to the cr...
Zirconia- and hafnia-based thin films have attracted tremendous attention in the past decade because...
Hafnia-based thin films are a favoured candidate for the integration of robust ferroelectricity at t...
Hafnia-based thin films are a favoured candidate for the integration of robust ferroelectricity at t...
(Anti-)ferroelectricity in complementary metal-oxide-semiconductor (CMOS)-compatible binary oxides h...
International audienceDoped HfO2 and HfO2-ZrO2 compounds are gaining significant interest thanks to ...
Rhombohedral phase HfxZr1-xO2 (HZO, x from 0 to 1) films are promising for achieving robust ferroele...
In the last decade orthorhombic hafnia and zirconia films have attracted tremendous attention arisin...
Doped HfO2 and HfO2-ZrO2 compounds are gaining significant interest thanks to their ferroelectric pr...
In this work, the ferroelectric characteristics of ZrO2 thin films grown on ITO-coated glass have be...
The discovery of ferroelectricity in HfO2-based thin films brings tremendous opportunities for emerg...
The transition metal oxides ZrO2 and HfO2 as well as their solid solution are widely researched and,...
A new approach for the stabilization of the ferroelectric orthorhombic ZrO2 films is demonstrated th...
This thesis reports a new polar r-phase, with large polarization and robustness. According to the cr...
Zirconia- and hafnia-based thin films have attracted tremendous attention in the past decade because...
Hafnia-based thin films are a favoured candidate for the integration of robust ferroelectricity at t...
Hafnia-based thin films are a favoured candidate for the integration of robust ferroelectricity at t...
(Anti-)ferroelectricity in complementary metal-oxide-semiconductor (CMOS)-compatible binary oxides h...
International audienceDoped HfO2 and HfO2-ZrO2 compounds are gaining significant interest thanks to ...
Rhombohedral phase HfxZr1-xO2 (HZO, x from 0 to 1) films are promising for achieving robust ferroele...
In the last decade orthorhombic hafnia and zirconia films have attracted tremendous attention arisin...
Doped HfO2 and HfO2-ZrO2 compounds are gaining significant interest thanks to their ferroelectric pr...
In this work, the ferroelectric characteristics of ZrO2 thin films grown on ITO-coated glass have be...
The discovery of ferroelectricity in HfO2-based thin films brings tremendous opportunities for emerg...
The transition metal oxides ZrO2 and HfO2 as well as their solid solution are widely researched and,...
A new approach for the stabilization of the ferroelectric orthorhombic ZrO2 films is demonstrated th...
This thesis reports a new polar r-phase, with large polarization and robustness. According to the cr...