Chemical vapor deposition (CVD) is a process used especially in the microelectronics industry to deposit films onto surfaces by means of chemical reactions of a volatile precursors. Its principal advantage over physical vapor deposition and atomic layer deposition techniques is that it can coat hidden and high aspect-ratio features both quickly and conformally. Some of the best- studied metal-containing precursors for CVD are metal complexes of deprotonated β-diketones such as acetylacetone (Hacac = CH3C(=O)CH2C(=O)CH3). Complexes of acac and other β- diketonates are known for almost every metal in the periodic table. When used as CVD precursors, these compounds primarily afford films of metal oxides, but require relatively high decompositi...