Tin and lithium plasmas emit efficiently in the in-band region (13.5 nm with 2% bandwidth) necessary for extreme ultraviolet (EUV) lithography. A detailed comparison of the atomic and ionic debris, as well as the emission features of tin and lithium plasmas has been conducted under identical experimental conditions. Planar slabs of pure tin and lithium were irradiated with 1064 nm, 9 ns neodymium-doped yttrium aluminum garnet (Nd:YAG) laser pulses for producing plasmas. A suite of diagnostics were used to analyze the emission and debris features, including optical emission spectroscopy (OES), a Faraday cup, an EUV pinhole camera, a power tool for the absolute measurement of EUV conversion efficiency (CE), etc. The results show that tin plas...
Tin, lithium, and xenon laser-produced plasmas are attractive candidates as light sources for extrem...
Extreme ultraviolet lithography(EUVL) is being developed worldwide as the next generation technology...
Laser-produced plasmas can be used as extreme ultraviolet (EUV) sources for lithography, operating i...
Detailed spectroscopic studies on extreme UV emission from laser plasmas using tin and lithium plana...
Detailed spectroscopic studies on extreme UV emission from laser plasmas using tin and lithium plana...
The majority of the studies on laser-produced plasmas as an efficient extreme ultraviolet (EUV) ligh...
Laser-produced tin plasmas are used for the generation of extreme ultraviolet light for nanolithogra...
The work presented in this thesis is primarily concerned with the optimisation of extreme ultraviole...
Out-of-band long wavelength emission measurements from high power, high-repetition-rate extreme-ultr...
Laser-produced plasmas (LPPs) are being considered as a light source for the next generation of extr...
We have previously proposed the use of mass-limited, tin-containing laser plasma sources for EUV lit...
Synopsis Highly charged tin ions are the sources of extreme ultraviolet (EUV) light at 13.5-nm wavel...
This paper describes lithium–tin alloys as a novel target material to enhance the efficiency of 13.5...
In this work, laser-matter interactions and resultant plasma emission using traditional short pulsed...
Hydrogen-like line emission from lithium has long been considered a candidate for EUV light source f...
Tin, lithium, and xenon laser-produced plasmas are attractive candidates as light sources for extrem...
Extreme ultraviolet lithography(EUVL) is being developed worldwide as the next generation technology...
Laser-produced plasmas can be used as extreme ultraviolet (EUV) sources for lithography, operating i...
Detailed spectroscopic studies on extreme UV emission from laser plasmas using tin and lithium plana...
Detailed spectroscopic studies on extreme UV emission from laser plasmas using tin and lithium plana...
The majority of the studies on laser-produced plasmas as an efficient extreme ultraviolet (EUV) ligh...
Laser-produced tin plasmas are used for the generation of extreme ultraviolet light for nanolithogra...
The work presented in this thesis is primarily concerned with the optimisation of extreme ultraviole...
Out-of-band long wavelength emission measurements from high power, high-repetition-rate extreme-ultr...
Laser-produced plasmas (LPPs) are being considered as a light source for the next generation of extr...
We have previously proposed the use of mass-limited, tin-containing laser plasma sources for EUV lit...
Synopsis Highly charged tin ions are the sources of extreme ultraviolet (EUV) light at 13.5-nm wavel...
This paper describes lithium–tin alloys as a novel target material to enhance the efficiency of 13.5...
In this work, laser-matter interactions and resultant plasma emission using traditional short pulsed...
Hydrogen-like line emission from lithium has long been considered a candidate for EUV light source f...
Tin, lithium, and xenon laser-produced plasmas are attractive candidates as light sources for extrem...
Extreme ultraviolet lithography(EUVL) is being developed worldwide as the next generation technology...
Laser-produced plasmas can be used as extreme ultraviolet (EUV) sources for lithography, operating i...