We report the experimental demonstration of deep-submicrometer inversion-mode In0.75Ga0.25As MOSFETs with ALD high-k Al2O3 as gate dielectric. In this letter, n-channel MOSFETs with 100-200-nm-long gates have been fabricated. At a supply voltage of 0.8 V, the fabricated devices with 200-130-nm-long gates exhibit drain currents of 232-440 mu A/mu m and transconductances of 538-705 mu S/mu m. The 100-nm device has a drain current of 801 mu A/mu m and a transconductance of 940 mu S/mu m. However, the device cannot be pinched off due to severe short-channel effect. Important scaling metrics, such as on/off current ratio, subthreshold swing, and drain-induced barrier lowering, are presented, and their relations to the short-channel effect are di...
The first inversion-mode gate-all-around (GAA) III-V MOSFETs are experimentally demonstrated with a ...
The properties of a new génération of MOS transistors have been investigated in respect of their ver...
[[abstract]]The use of compound semiconductors as the channel material has recently drawn great atte...
We reported the experimental demonstration of deep-submicrometer inversion-mode In0....
High-performance inversion-type enhancementmode (E-mode) n-channel In0.65Ga0.35As MOSFETs with atomi...
As the Si CMOS roadmap for scaling approaches its fundamental physics limits, alternatives have been...
AbstractIn this paper, we investigate the scaling and carrier transport behavior of sub-100nm In0.7G...
The silicon basec complementary metal-oxide-semicoonductor (CMOS) technology now faces ever shrinkin...
Scaling of metal-oxide-semiconductor (MOS) transistors to smaller dimensions has been a key driving ...
High-performance inversion-type enhancement-mode n-channel In0.65Ga0.35As metal-oxide-semiconductor ...
In conclusion, this paper reports a number of significant developments in III-V MOSFET devices. Reta...
In this paper we present a 55 nm gate length In0.53Ga0.47As MOSFET with extrinsic transconductance o...
International audienceIn this paper, a 200 nm n-channel inversion-type self-aligned In 0.53 Ga 0.47 ...
layer-deposited (ALD) Al2O3 as gate dielectric are demonstrated. A 0.75-μm-gate-length device has a ...
As Silicon complementary-oxide-semiconductor (CMOS) devices scale into the sub-22nm regime, severe s...
The first inversion-mode gate-all-around (GAA) III-V MOSFETs are experimentally demonstrated with a ...
The properties of a new génération of MOS transistors have been investigated in respect of their ver...
[[abstract]]The use of compound semiconductors as the channel material has recently drawn great atte...
We reported the experimental demonstration of deep-submicrometer inversion-mode In0....
High-performance inversion-type enhancementmode (E-mode) n-channel In0.65Ga0.35As MOSFETs with atomi...
As the Si CMOS roadmap for scaling approaches its fundamental physics limits, alternatives have been...
AbstractIn this paper, we investigate the scaling and carrier transport behavior of sub-100nm In0.7G...
The silicon basec complementary metal-oxide-semicoonductor (CMOS) technology now faces ever shrinkin...
Scaling of metal-oxide-semiconductor (MOS) transistors to smaller dimensions has been a key driving ...
High-performance inversion-type enhancement-mode n-channel In0.65Ga0.35As metal-oxide-semiconductor ...
In conclusion, this paper reports a number of significant developments in III-V MOSFET devices. Reta...
In this paper we present a 55 nm gate length In0.53Ga0.47As MOSFET with extrinsic transconductance o...
International audienceIn this paper, a 200 nm n-channel inversion-type self-aligned In 0.53 Ga 0.47 ...
layer-deposited (ALD) Al2O3 as gate dielectric are demonstrated. A 0.75-μm-gate-length device has a ...
As Silicon complementary-oxide-semiconductor (CMOS) devices scale into the sub-22nm regime, severe s...
The first inversion-mode gate-all-around (GAA) III-V MOSFETs are experimentally demonstrated with a ...
The properties of a new génération of MOS transistors have been investigated in respect of their ver...
[[abstract]]The use of compound semiconductors as the channel material has recently drawn great atte...