Lithography on GaP(100) surfaces

Two types of lithographic methods were used to modify GaP(1 00) surfaces with commercially available alkanethiol molecules: microcontact printing (mu CP) and dip-pen nanolithography (DPN), The patterned surfaces were characterized by atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared reflection absorption spectroscopy (FT-IRRAS). The characterization was done in order to understand the quality of each type of pattern, its chemical composition, and the organization of the molecules on the surface. Differences between the two lithographic methods used to do lithography on the GaP(1 00) in this study were dependent on the chosen molecular ink