International audienceIn this work, we present the structural, optical and photocatalytic properties of BiVO4 thin films produced by a dual-magnetron sputtering process using both Bi2O3 (alpha-phase, 99.98 % purity) and V (99.9 % purity) targets under Ar/O-2 atmosphere with a ratio of 18:2. The films were deposited varying the power applied to the targets to obtain stoichiometric films, and the monoclinic structure was achieved by post-deposition annealing. The dual process was chosen to better control the Bi/V ratio since Bi and V have very different sputtering yields. In particular, the influence of a chemical treatment using potassium hydroxide (KOH) on the optical properties and different dye discolorations (acid blue 113 and methyl ora...
International audienceNanoporous BiVO4 thin films were deposited using reactive magnetronsputtering ...
Photoactive bismuth vanadate BiVO4 thin films were deposited by reactive co magnetron sputtering f...
Photoactive bismuth vanadate BiVO4 thin films were deposited by reactive co magnetron sputtering f...
International audienceIn this work, we present the structural, optical and photocatalytic properties...
International audienceHaving strong photoactivity under visible light, BiVO4 thin film is considered...
International audienceHaving strong photoactivity under visible light, BiVO4 thin film is considered...
International audienceCu, Mo-doped and pristine BiVO4 thin films were realized by coupling rf sputte...
International audienceCu, Mo-doped and pristine BiVO4 thin films were realized by coupling rf sputte...
International audienceCu, Mo-doped and pristine BiVO4 thin films were realized by coupling rf sputte...
International audienceCu, Mo-doped and pristine BiVO4 thin films were realized by coupling rf sputte...
International audienceCu, Mo-doped and pristine BiVO4 thin films were realized by coupling rf sputte...
International audienceIn this study, nanoporous BiVO4 thin films were deposited using reactive direc...
International audienceIn this study, nanoporous BiVO4 thin films were deposited using reactive direc...
International audienceThe synthesis of Cu-doped BiVO4 nanoporous thin films with various Cu contents...
Thin films of bismuth vanadate (BiVO4) are deposited through the solution combustion synthesis techn...
International audienceNanoporous BiVO4 thin films were deposited using reactive magnetronsputtering ...
Photoactive bismuth vanadate BiVO4 thin films were deposited by reactive co magnetron sputtering f...
Photoactive bismuth vanadate BiVO4 thin films were deposited by reactive co magnetron sputtering f...
International audienceIn this work, we present the structural, optical and photocatalytic properties...
International audienceHaving strong photoactivity under visible light, BiVO4 thin film is considered...
International audienceHaving strong photoactivity under visible light, BiVO4 thin film is considered...
International audienceCu, Mo-doped and pristine BiVO4 thin films were realized by coupling rf sputte...
International audienceCu, Mo-doped and pristine BiVO4 thin films were realized by coupling rf sputte...
International audienceCu, Mo-doped and pristine BiVO4 thin films were realized by coupling rf sputte...
International audienceCu, Mo-doped and pristine BiVO4 thin films were realized by coupling rf sputte...
International audienceCu, Mo-doped and pristine BiVO4 thin films were realized by coupling rf sputte...
International audienceIn this study, nanoporous BiVO4 thin films were deposited using reactive direc...
International audienceIn this study, nanoporous BiVO4 thin films were deposited using reactive direc...
International audienceThe synthesis of Cu-doped BiVO4 nanoporous thin films with various Cu contents...
Thin films of bismuth vanadate (BiVO4) are deposited through the solution combustion synthesis techn...
International audienceNanoporous BiVO4 thin films were deposited using reactive magnetronsputtering ...
Photoactive bismuth vanadate BiVO4 thin films were deposited by reactive co magnetron sputtering f...
Photoactive bismuth vanadate BiVO4 thin films were deposited by reactive co magnetron sputtering f...