The possibility to tune the elemental composition and structure of binary Me oxynitride-type compounds (Me1Me2ON) could lead to attractive properties for several applications. For this work, tantalum-titanium oxynitride (TaTiON) thin films were deposited by DC reactive magnetron co-sputtering, with a –50 V bias voltage applied to the substrate holder and a constant substrate temperature of 100 ◦C. To increase or to decrease in a controlled manner, the Ti and Ta content in the co-sputtered films, the Ti and Ta target currents were varied between 0.00 and 1.00 A, in 0.25 A steps, while keeping the sum of the currents applied to the two targets at 1.00 A. The reactive gases flow, consisting of a nitrogen and oxygen gas mixture with a constant ...
Thin films of titanium oxynitride were successfully prepared by dc reactive magnetron sputtering usi...
Tantalum oxynitride thin films have been deposited by reactive magnetron sputtering, using a fixed p...
Tantalum oxynitride (TaNxOy) thin films were produced by magnetron sputtering. This work analyzes an...
Direct current magnetron co-sputtered titanium and tantalum based oxynitride coatings (TaTiON) were ...
The main purpose of this work is to present and to interpret the change of structure and physical pr...
Tantalum oxynitride thin films were deposited by reactive magnetron sputtering in a N2+O2 (85%+15%) ...
Tantalum oxynitride thin films were produced by magnetron sputtering. The films were deposited using...
The main purpose of this work is to present and to interpret the change of structure and physical p...
The main purpose of this work is to present and to interpret the change of electrical properties of ...
The main purpose of this work is to present and to interpret the change of electrical properties of ...
Tantalum oxynitride thin films have been deposited by reactive magnetron sputtering, using a fixed p...
cited By 6International audienceTantalum oxynitride thin films were produced by magnetron sputtering...
This paper aims to present the results concerning the structural characterization and some of the pr...
International audienceOxynitride materials, which offer the possibility of merging oxide and nitride...
International audienceOxynitride materials, which offer the possibility of merging oxide and nitride...
Thin films of titanium oxynitride were successfully prepared by dc reactive magnetron sputtering usi...
Tantalum oxynitride thin films have been deposited by reactive magnetron sputtering, using a fixed p...
Tantalum oxynitride (TaNxOy) thin films were produced by magnetron sputtering. This work analyzes an...
Direct current magnetron co-sputtered titanium and tantalum based oxynitride coatings (TaTiON) were ...
The main purpose of this work is to present and to interpret the change of structure and physical pr...
Tantalum oxynitride thin films were deposited by reactive magnetron sputtering in a N2+O2 (85%+15%) ...
Tantalum oxynitride thin films were produced by magnetron sputtering. The films were deposited using...
The main purpose of this work is to present and to interpret the change of structure and physical p...
The main purpose of this work is to present and to interpret the change of electrical properties of ...
The main purpose of this work is to present and to interpret the change of electrical properties of ...
Tantalum oxynitride thin films have been deposited by reactive magnetron sputtering, using a fixed p...
cited By 6International audienceTantalum oxynitride thin films were produced by magnetron sputtering...
This paper aims to present the results concerning the structural characterization and some of the pr...
International audienceOxynitride materials, which offer the possibility of merging oxide and nitride...
International audienceOxynitride materials, which offer the possibility of merging oxide and nitride...
Thin films of titanium oxynitride were successfully prepared by dc reactive magnetron sputtering usi...
Tantalum oxynitride thin films have been deposited by reactive magnetron sputtering, using a fixed p...
Tantalum oxynitride (TaNxOy) thin films were produced by magnetron sputtering. This work analyzes an...