A method has been devised to extract the two-dimensional ionization profiles from spatially resolved ion density measurements made in a capacitively coupled argon rf plasma. This technique is valid if the production process is ionization and the loss process is ambipolar diffusion. As this procedure calculates the total production ~ionization! term, processes such as two-step ionization and photoionization are included. The main benefit of this new technique is that it extracts ionization rates that pertain to the total ionization in the discharge. It follows that this technique could be used to determine when other ionization processes ~e.g., photo- and two-step ionization! are important. On testing with experimental data, the inver...
In this paper, 2-D plasma density profile is measured in an inductively coupled plasma (ICP) with ch...
International audienceWe present new results on ionization by electron impacts in a dense plasma. We...
It is crucial to measure the electron density (ne) and temperature (Te) for applications such as dev...
A method has been devised to extract the two-dimensional ionization profiles from spatially resolve...
Contribution of stepwise ionization to total ionization was experimentally investigated in low-press...
Plasma describes the property of ionized gas that follows the shape of the object where it was creat...
A new interpolation to estimate a spatial profile of plasma densities of unmeasured regions for two-...
We present a method to determine the electron density, n(e), of an argon plasma jet using the contin...
A new approach to evaluating departures from local thermal equilibrium (LTE) in the inductively coup...
A hybrid Monte Carlo-fluid model has been developed for the description of electrons, argon ions, an...
The electron energy relaxation in space has been investigated for electropositive Ar and electronega...
The behavior of an rf discharge can be modeled by using a fluid approach. For this approach, the val...
International audienceThis work is devoted to the study of the electron density measured by means of...
A capacitively coupled rf plasma is investigated in the context of the heating mechanisms that susta...
Two-dimensional ion velocity distribution functions (IVDFs) of argon plasmas have been measured with...
In this paper, 2-D plasma density profile is measured in an inductively coupled plasma (ICP) with ch...
International audienceWe present new results on ionization by electron impacts in a dense plasma. We...
It is crucial to measure the electron density (ne) and temperature (Te) for applications such as dev...
A method has been devised to extract the two-dimensional ionization profiles from spatially resolve...
Contribution of stepwise ionization to total ionization was experimentally investigated in low-press...
Plasma describes the property of ionized gas that follows the shape of the object where it was creat...
A new interpolation to estimate a spatial profile of plasma densities of unmeasured regions for two-...
We present a method to determine the electron density, n(e), of an argon plasma jet using the contin...
A new approach to evaluating departures from local thermal equilibrium (LTE) in the inductively coup...
A hybrid Monte Carlo-fluid model has been developed for the description of electrons, argon ions, an...
The electron energy relaxation in space has been investigated for electropositive Ar and electronega...
The behavior of an rf discharge can be modeled by using a fluid approach. For this approach, the val...
International audienceThis work is devoted to the study of the electron density measured by means of...
A capacitively coupled rf plasma is investigated in the context of the heating mechanisms that susta...
Two-dimensional ion velocity distribution functions (IVDFs) of argon plasmas have been measured with...
In this paper, 2-D plasma density profile is measured in an inductively coupled plasma (ICP) with ch...
International audienceWe present new results on ionization by electron impacts in a dense plasma. We...
It is crucial to measure the electron density (ne) and temperature (Te) for applications such as dev...