Microstructural evolution and deformation mechanisms of magnetron sputtered V-Si-N coatings with various Si contents are investigated by transmission electron microscopy, X-ray absorption spectroscopy, and ab initio calculations. A small amount of Si atoms was dissolved into the cubic VN lattice, locally reducing the neighboring V-N p-d hybridization near the Si site. The Si content was found to impact the architecture of coating significantly. With increasing Si content, the microstructure evolved through three different architectures: (i) highly textured columnar grains, (ii) refined columnar grains, and (iii) nanocomposite structures where elongated grains were bounded by vein-like boundaries. Enhanced damage tolerance was observed in th...
(Ti,Al,Si)N coatings were deposited on HSS or silicon substrates by DC reactive UM magnetron sputter...
ZrN/Si3N4 multilayer coating that alternates with either nanocrystalline ZrN or amorphous Si3N4 inte...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
Microstructural evolution and deformation mechanisms of magnetron sputtered V-Si-N coatings with var...
Cutting tool life can be extended by using coatings, and that presents many opportunities to reduce ...
With the concept of digital factory, a research including experiment, kinetic Monte Carlo simulation...
Here we examine the equilibrium solubility of silicon in a nitride matrix with a relatively low bond...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
VAlSiN coatings with different Si contents were deposited at 300℃ by reactive magnetron sputtering. ...
This licentiate thesis adds a new piece to the puzzle that describes how the microstructural charact...
Magnetron sputtered Al–Si–N thin films with varying silicon content were developed by Al–Si target w...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
A direct link between the microstructure and mechanical properties of CrSiN coatings with varying Si...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
(Ti,Si,Al)N nanocomposite coatings with different Ti, Si, Al contents, were deposited onto silicon a...
(Ti,Al,Si)N coatings were deposited on HSS or silicon substrates by DC reactive UM magnetron sputter...
ZrN/Si3N4 multilayer coating that alternates with either nanocrystalline ZrN or amorphous Si3N4 inte...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
Microstructural evolution and deformation mechanisms of magnetron sputtered V-Si-N coatings with var...
Cutting tool life can be extended by using coatings, and that presents many opportunities to reduce ...
With the concept of digital factory, a research including experiment, kinetic Monte Carlo simulation...
Here we examine the equilibrium solubility of silicon in a nitride matrix with a relatively low bond...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
VAlSiN coatings with different Si contents were deposited at 300℃ by reactive magnetron sputtering. ...
This licentiate thesis adds a new piece to the puzzle that describes how the microstructural charact...
Magnetron sputtered Al–Si–N thin films with varying silicon content were developed by Al–Si target w...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
A direct link between the microstructure and mechanical properties of CrSiN coatings with varying Si...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
(Ti,Si,Al)N nanocomposite coatings with different Ti, Si, Al contents, were deposited onto silicon a...
(Ti,Al,Si)N coatings were deposited on HSS or silicon substrates by DC reactive UM magnetron sputter...
ZrN/Si3N4 multilayer coating that alternates with either nanocrystalline ZrN or amorphous Si3N4 inte...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...