Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror

An elliptical mirror for X-ray microfocusing was manufactured using the new fabrication methods of elastic emission machining and plasma chemical vaporization machining. Surface profiles measured using stitching interferometry showed a maximum deviation around the ideal figure of 7 nm peak-to-valley. The mirror showed nearly diffraction-limited focusing performance, with a 200 nm line width at the focus. Wave-optical calculations, taking the measured surface profile into consideration, reproduced well the measured focusing properties both at and around the beam waist.Yamauchi, K., Yamamura, K., Mimura, H., Sano, Y., Saito, A., Souvorov, A., Yabashi, M., Tamasaku, K., Ishikawa, T. & Mori, Y. (2002). J. Synchrotron Rad. 9, 313-316