10.1116/1.1507339Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films2061903-1910JVTA
The kinetics of thermal decomposition of nickel formate are significantly influenced by the disposit...
Nickel aluminide coatings were produced on steel substrates by reactive thermal processing of pre-pl...
Pure nickel and gold thin films were vacuum-deposited on (111) silicon single crystals. When Ni/Au/S...
The interfacial reactions and chemical phase formation between nickel and ultrahigh vacuum chemical ...
The interfacial reaction of Ni with Si, Si₀.₇₅Ge₀.₂₅, and Ge at 400°C has been investigated. A unifo...
Solid state reactions between 1000A thick Nickel films and 4000A thick amorphous Si$\sb{\rm 1-x}$Ge$...
The formation of nickel germanide has been examined over a range of low temperatures (200-400 °C) in...
Pulsed KrF laser annealing and vacuum annealing on the interfacial reactions of Ni/Si,,,,Ge,,2, and ...
L’objectif de cette thèse est d’étudier les phases formées lors de la réaction à l’état solide entre...
10.1116/1.2137329Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films24184-90JVTA
The effect of reactive deposition of Ni on the thermal stability of Ni silicide has been investigate...
International audienceSolid-state reactions between Ni1-uPtu (0< u < 0.15 at.%) and Si0.7Ge0.3 after...
International audienceThe Si(Ge) alloy is currently used in the Complementary Metal Oxide Semiconduc...
International audienceThe effect of annealing ambient during rapid thermal processing on thermal sta...
Shock initiated chemical reaction experiments have been performed on a 1:1 atomic ratio mixture of 2...
The kinetics of thermal decomposition of nickel formate are significantly influenced by the disposit...
Nickel aluminide coatings were produced on steel substrates by reactive thermal processing of pre-pl...
Pure nickel and gold thin films were vacuum-deposited on (111) silicon single crystals. When Ni/Au/S...
The interfacial reactions and chemical phase formation between nickel and ultrahigh vacuum chemical ...
The interfacial reaction of Ni with Si, Si₀.₇₅Ge₀.₂₅, and Ge at 400°C has been investigated. A unifo...
Solid state reactions between 1000A thick Nickel films and 4000A thick amorphous Si$\sb{\rm 1-x}$Ge$...
The formation of nickel germanide has been examined over a range of low temperatures (200-400 °C) in...
Pulsed KrF laser annealing and vacuum annealing on the interfacial reactions of Ni/Si,,,,Ge,,2, and ...
L’objectif de cette thèse est d’étudier les phases formées lors de la réaction à l’état solide entre...
10.1116/1.2137329Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films24184-90JVTA
The effect of reactive deposition of Ni on the thermal stability of Ni silicide has been investigate...
International audienceSolid-state reactions between Ni1-uPtu (0< u < 0.15 at.%) and Si0.7Ge0.3 after...
International audienceThe Si(Ge) alloy is currently used in the Complementary Metal Oxide Semiconduc...
International audienceThe effect of annealing ambient during rapid thermal processing on thermal sta...
Shock initiated chemical reaction experiments have been performed on a 1:1 atomic ratio mixture of 2...
The kinetics of thermal decomposition of nickel formate are significantly influenced by the disposit...
Nickel aluminide coatings were produced on steel substrates by reactive thermal processing of pre-pl...
Pure nickel and gold thin films were vacuum-deposited on (111) silicon single crystals. When Ni/Au/S...
DOI
Add to ORKG