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Real-time monitoring of photoresist thickness contour in microlithography

Ho, W.K.
Chen, X.
Wu, X.
Tay, A.

Publication date

January 2006

DOI

10.1109/ISSM.2006.4493108

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

ISSN

1523-553X

Abstract

10.1109/ISSM.2006.4493108IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings364-36

Extracted data

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