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Lithography in UV photoresist using NSOM

Lin, Y.
Hong, M.H.
Wang, W.J.
Law, Y.Z.
Chong, T.C.

Publication date

January 2004

DOI

10.1117/12.595859

Publisher

SPIE-Intl Soc Optical Eng

Citation count (estimate)

3

Abstract

10.1117/12.595859Proceedings of SPIE - The International Society for Optical Engineering566277-82PSIS

Extracted data

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