10.1109/ESSDER.2006.307694ESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference286-28
The performance of the n-channel Schottky barrier MOSFET with asymmetric barrier height at source/dr...
The dc and radio-frequency performance of 85-nm gate-length p-channel PtSi source/drain Schottky-bar...
The effect of silicidation induced dopant segregation (DS) on the electrical behavior of silicon-on-...
Abstract — In this paper, we study experimentally and numerically the Schottky barrier height (SBH) ...
Abstract—In this letter, the Schottky-barrier height (SBH) low-ering in Pt silicide/n-Si junctions a...
This paper proposes to study the impact of a moderate variation of the channel doping level on the e...
In this letter, the Schottky-barrier height (SBH) lowering in Pt silicide/n-Si junctions and its imp...
Alors que le développement industriel des technologies CMOS-SOI aborde le cap des longueurs de grill...
The Schottky barrier MOSFET has been proposed recently as an alternative to traditional MOSFET for s...
We examine the subthreshold behavior of metal oxide semiconductor field effect transis-tors (MOSFETs...
In this paper. we present a detailed study of nickel-silicide source and drain Schottky barrier MOSF...
In this paper we present a simulation framework to account for the Schottky barrier lowering models ...
Dopant-segregated Schottky source/drain tunneling field effect transistors (STFET) are investigated ...
As continued MOSFETs scaling becomes increasingly challenging, solutions are urgently needed to meet...
The inhomogeneity of Schottky-barrier (SB) height Phi(B) is found to strongly affect the threshold v...
The performance of the n-channel Schottky barrier MOSFET with asymmetric barrier height at source/dr...
The dc and radio-frequency performance of 85-nm gate-length p-channel PtSi source/drain Schottky-bar...
The effect of silicidation induced dopant segregation (DS) on the electrical behavior of silicon-on-...
Abstract — In this paper, we study experimentally and numerically the Schottky barrier height (SBH) ...
Abstract—In this letter, the Schottky-barrier height (SBH) low-ering in Pt silicide/n-Si junctions a...
This paper proposes to study the impact of a moderate variation of the channel doping level on the e...
In this letter, the Schottky-barrier height (SBH) lowering in Pt silicide/n-Si junctions and its imp...
Alors que le développement industriel des technologies CMOS-SOI aborde le cap des longueurs de grill...
The Schottky barrier MOSFET has been proposed recently as an alternative to traditional MOSFET for s...
We examine the subthreshold behavior of metal oxide semiconductor field effect transis-tors (MOSFETs...
In this paper. we present a detailed study of nickel-silicide source and drain Schottky barrier MOSF...
In this paper we present a simulation framework to account for the Schottky barrier lowering models ...
Dopant-segregated Schottky source/drain tunneling field effect transistors (STFET) are investigated ...
As continued MOSFETs scaling becomes increasingly challenging, solutions are urgently needed to meet...
The inhomogeneity of Schottky-barrier (SB) height Phi(B) is found to strongly affect the threshold v...
The performance of the n-channel Schottky barrier MOSFET with asymmetric barrier height at source/dr...
The dc and radio-frequency performance of 85-nm gate-length p-channel PtSi source/drain Schottky-bar...
The effect of silicidation induced dopant segregation (DS) on the electrical behavior of silicon-on-...