10.1116/1.1362679Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films193793-797JVTA
The initial transient phenomenon in plasma processing, an intrinsic and unstable phenomenon of the g...
Silicon-nitride films were deposited by a plasma-enhanced-chemical-vapour-deposition (PECVD) techniq...
The aim is to investigate and develop the low-temperature method for plasma-chemical deposition of t...
We developed a mathematical model of Plasma Enhanced Chemical Vapor Deposition (PECVD) of silicon ni...
This paper looks at 150ºC silicon nitride by plasma enhanced chemical vapor deposition for amorphous...
The growth of silicon nitride crystalline films using microwave plasma enhanced chemical vapor depos...
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes2491238-1239JAPN
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes25101490-1494JAPN
Silicon nitride films were deposited by a plasma-enhanced chemical vapour deposition technique using...
The paper reports on the chemical composition of titanium nitride (TiN) and silicon (Si) coatings de...
Refractory ternary nitride films for diffusion barriers in microelectronics have been grown using ch...
Eindhoven Title: Plasma-enhanced chemical vapor deposition of silicon dioxide: optimiz-ing dielectri...
A new system of dielectric deposition using a multipolar plasma enhanced by a hot filament has been ...
This item was digitized from a paper original and/or a microfilm copy. If you need higher-resolution...
Silicon nitride films were deposited by a plasma-enhanced chemical vapour deposition technique using...
The initial transient phenomenon in plasma processing, an intrinsic and unstable phenomenon of the g...
Silicon-nitride films were deposited by a plasma-enhanced-chemical-vapour-deposition (PECVD) techniq...
The aim is to investigate and develop the low-temperature method for plasma-chemical deposition of t...
We developed a mathematical model of Plasma Enhanced Chemical Vapor Deposition (PECVD) of silicon ni...
This paper looks at 150ºC silicon nitride by plasma enhanced chemical vapor deposition for amorphous...
The growth of silicon nitride crystalline films using microwave plasma enhanced chemical vapor depos...
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes2491238-1239JAPN
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes25101490-1494JAPN
Silicon nitride films were deposited by a plasma-enhanced chemical vapour deposition technique using...
The paper reports on the chemical composition of titanium nitride (TiN) and silicon (Si) coatings de...
Refractory ternary nitride films for diffusion barriers in microelectronics have been grown using ch...
Eindhoven Title: Plasma-enhanced chemical vapor deposition of silicon dioxide: optimiz-ing dielectri...
A new system of dielectric deposition using a multipolar plasma enhanced by a hot filament has been ...
This item was digitized from a paper original and/or a microfilm copy. If you need higher-resolution...
Silicon nitride films were deposited by a plasma-enhanced chemical vapour deposition technique using...
The initial transient phenomenon in plasma processing, an intrinsic and unstable phenomenon of the g...
Silicon-nitride films were deposited by a plasma-enhanced-chemical-vapour-deposition (PECVD) techniq...
The aim is to investigate and develop the low-temperature method for plasma-chemical deposition of t...
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