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Critical dimension uniformity via real-time photoresist thickness control

Ho, W.K.
Tay, A.
Chen, M.
Fu, J.
Lu, H.
Shan, X.

Publication date

November 2007

DOI

10.1109/TSM.2007.907610

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

ISSN

0894-6507

Abstract

10.1109/TSM.2007.907610IEEE Transactions on Semiconductor Manufacturing204376-380ITSM

Extracted data

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