An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography

Use of real time wafer temperature determination for the study of unintentional parameter influences in the MOVPE of nitrides

Hardtdegen, H.
Kaluza, N.
Steins, R.
Cho, Y. S.
Sofer, Z.
Zorn, M.
Haberland, K.
Zettler, J.-T.

January 2005

In this paper we will first report on the use of real-time determination of wafer temperature for tr...

Robust thermal control for CMOS-based lab-on-chip systems

Martinez-Quijada, Jose
Ma, Tianchi
Hall, Gordon H.
Reynolds, Matt
Sloan, David
Caverhill-Godkewitsch, Saul
Glerum, D. Moira
Sameoto, Dan
Elliott, Duncan G.
Backhouse, Christopher J.

July 2015

The need for precise temperature control at small scales has provided a formidable challenge to the ...

Real-time control of photoresist extinction coefficient uniformity in the microlithography process

Tay, A.
Ho, W.K.
Wu, X.

January 2007

10.1109/TCST.2006.883244IEEE Transactions on Control Systems Technology15199-105IETT

Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography

Tay, A.
Ho, W.-K.
Hu, N.
Tsai, K.-Y.
Zhou, Y.

January 2006

10.1117/12.654741Proceedings of SPIE - The International Society for Optical Engineering6155-PSIS

In-situ real-time temperature control of baking systems in lithography

Wang, Y.
Chua, H.-T.
Tay, A.

January 2008

10.1117/12.772719Proceedings of SPIE - The International Society for Optical Engineering6922-PSIS

Real time, in-situ temperature monitoring using diffuse reflectance spectroscopy

Booth, J.L.
Beard, B.T.
Pearsall, T.P.
Wang, Z.Z.
Stevens, J.E.
Blain, M.G.
Meisenheimer, T.L.

November 1996

Real time temperature measurements have been performed on both GaAs and silicon substrates during wa...

In-Situ, Across Wafer Temperature Measurement Apparatus for Semiconductor Fabrication Equipment

Hofhine, Mark

December 2004

The measurement of process variables such as temperature, stress/strain, force, and pressure at diff...

Temperature control and in situ fault detection of wafer warpage

Ho, W.K.
Yap, C.
Tay, A.
Chen, W.
Zhou, Y.
Tan, W.W.
Chen, M.

February 2007

10.1109/TSM.2006.890314IEEE Transactions on Semiconductor Manufacturing2011-4ITSM

Micro thermoindicators and optical-electronic temperature control for microfluidic applications

Liu, Liyu
Peng, Suili
Wen, Weijia
Sheng, Ping

January 2007

The authors report the design and implementation of sensing and control of local temperature in poly...

Detection of Wafer warpages during thermal processing in microlithography

Ho, W.K.
Tay, A.
Zhou, Y.
Yang, K.
Hu, N.

January 2004

2004 8th International Conference on Control, Automation, Robotics and Vision (ICARCV)1485-49

An in-situ temperature measurement system for DUV lithography

Tan, W.W.
Li, R.F.Y.

August 2003

10.1109/TIM.2003.815987IEEE Transactions on Instrumentation and Measurement5241136-1142IEIM

On-chip fabrication to add temperature control to a microfluidic solution exchange system

Bridle, Helen
Millingen, Maria
Jesorka, Aldo

January 2008

We present a concept for the post production modification of commercially available microfluidic dev...

In-situ measurement & control of photoresist development in microlithography

Kiew, C.M.
Tay, A.
Ho, W.K.
Lim, K.W.
Zhou, Y.

January 2005

10.1109/IMTC.2004.1351183Conference Record - IEEE Instrumentation and Measurement Technology Confere...

In-situ measurement & control of photoresist development in microlithography

Kiew, C.M.
Tay, A.
Ho, W.K.
Lim, K.W.
Zhou, Y.

January 2005

10.1109/IMTC.2004.1351183Conference Record - IEEE Instrumentation and Measurement Technology Confere...

for Flexible IC Processing

Author(s E It//darpa
Professor Thomas
Kailath Mar F--c

January 1991

13. ABSTRACT (Maximurn 200 words". The objective of this DARPA research project was to develop ...

Use of real time wafer temperature determination for the study of unintentional parameter influences in the MOVPE of nitrides

Hardtdegen, H.
Kaluza, N.
Steins, R.
Cho, Y. S.
Sofer, Z.
Zorn, M.
Haberland, K.
Zettler, J.-T.

January 2005

In this paper we will first report on the use of real-time determination of wafer temperature for tr...

Robust thermal control for CMOS-based lab-on-chip systems

Martinez-Quijada, Jose
Ma, Tianchi
Hall, Gordon H.
Reynolds, Matt
Sloan, David
Caverhill-Godkewitsch, Saul
Glerum, D. Moira
Sameoto, Dan
Elliott, Duncan G.
Backhouse, Christopher J.

July 2015

The need for precise temperature control at small scales has provided a formidable challenge to the ...

Real-time control of photoresist extinction coefficient uniformity in the microlithography process

Tay, A.
Ho, W.K.
Wu, X.

January 2007

10.1109/TCST.2006.883244IEEE Transactions on Control Systems Technology15199-105IETT

Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography

Tay, A.
Ho, W.-K.
Hu, N.
Tsai, K.-Y.
Zhou, Y.

January 2006

10.1117/12.654741Proceedings of SPIE - The International Society for Optical Engineering6155-PSIS

In-situ real-time temperature control of baking systems in lithography

Wang, Y.
Chua, H.-T.
Tay, A.

January 2008

10.1117/12.772719Proceedings of SPIE - The International Society for Optical Engineering6922-PSIS

Real time, in-situ temperature monitoring using diffuse reflectance spectroscopy

Booth, J.L.
Beard, B.T.
Pearsall, T.P.
Wang, Z.Z.
Stevens, J.E.
Blain, M.G.
Meisenheimer, T.L.

November 1996

Real time temperature measurements have been performed on both GaAs and silicon substrates during wa...

In-Situ, Across Wafer Temperature Measurement Apparatus for Semiconductor Fabrication Equipment

Hofhine, Mark

December 2004

The measurement of process variables such as temperature, stress/strain, force, and pressure at diff...

Temperature control and in situ fault detection of wafer warpage

Ho, W.K.
Yap, C.
Tay, A.
Chen, W.
Zhou, Y.
Tan, W.W.
Chen, M.

February 2007

10.1109/TSM.2006.890314IEEE Transactions on Semiconductor Manufacturing2011-4ITSM

Micro thermoindicators and optical-electronic temperature control for microfluidic applications

Liu, Liyu
Peng, Suili
Wen, Weijia
Sheng, Ping

January 2007

The authors report the design and implementation of sensing and control of local temperature in poly...

Detection of Wafer warpages during thermal processing in microlithography

Ho, W.K.
Tay, A.
Zhou, Y.
Yang, K.
Hu, N.

January 2004

2004 8th International Conference on Control, Automation, Robotics and Vision (ICARCV)1485-49

An in-situ temperature measurement system for DUV lithography

Tan, W.W.
Li, R.F.Y.

August 2003

10.1109/TIM.2003.815987IEEE Transactions on Instrumentation and Measurement5241136-1142IEIM

On-chip fabrication to add temperature control to a microfluidic solution exchange system

Bridle, Helen
Millingen, Maria
Jesorka, Aldo

January 2008

We present a concept for the post production modification of commercially available microfluidic dev...

In-situ measurement & control of photoresist development in microlithography

Kiew, C.M.
Tay, A.
Ho, W.K.
Lim, K.W.
Zhou, Y.

January 2005

10.1109/IMTC.2004.1351183Conference Record - IEEE Instrumentation and Measurement Technology Confere...

In-situ measurement & control of photoresist development in microlithography

Kiew, C.M.
Tay, A.
Ho, W.K.
Lim, K.W.
Zhou, Y.

January 2005

10.1109/IMTC.2004.1351183Conference Record - IEEE Instrumentation and Measurement Technology Confere...

for Flexible IC Processing

Author(s E It//darpa
Professor Thomas
Kailath Mar F--c

January 1991

13. ABSTRACT (Maximurn 200 words". The objective of this DARPA research project was to develop ...

Use of real time wafer temperature determination for the study of unintentional parameter influences in the MOVPE of nitrides

Hardtdegen, H.
Kaluza, N.
Steins, R.
Cho, Y. S.
Sofer, Z.
Zorn, M.
Haberland, K.
Zettler, J.-T.

January 2005

In this paper we will first report on the use of real-time determination of wafer temperature for tr...

Robust thermal control for CMOS-based lab-on-chip systems

Martinez-Quijada, Jose
Ma, Tianchi
Hall, Gordon H.
Reynolds, Matt
Sloan, David
Caverhill-Godkewitsch, Saul
Glerum, D. Moira
Sameoto, Dan
Elliott, Duncan G.
Backhouse, Christopher J.

July 2015

The need for precise temperature control at small scales has provided a formidable challenge to the ...

Real-time control of photoresist extinction coefficient uniformity in the microlithography process

Tay, A.
Ho, W.K.
Wu, X.

January 2007

10.1109/TCST.2006.883244IEEE Transactions on Control Systems Technology15199-105IETT

An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography

Abstract

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An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography

Abstract

Extracted data

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