High-density electrical and optical probes for neural readout and light focusing in deep brain tissue

To advance neuroscience in vivo experiments, it is necessary to probe a high density of neurons in neural networks with single-cell resolution and be able to simultaneously use different techniques, such as electrophysiological recordings and optogenetic intervention, while minimizing brain tissue damage. We first fabricate electrical neural probes with a high density of electrodes and small tip profile (cross section of shank: 47-μm width × 16-μm thickness). Then, with similar substrate and fabrication techniques, we separately fabricate optical neural probes. We finally indicate a fabrication method that may allow integrating the two functionalities into the same device. High-density electrical probes have been fabricated with 64 pads. Interconnections to deliver the signal are 120-nm wide, and the pads are 5 × 25 μm. Separate optical probes with similar shank dimensions with silicon dioxide and silicon nitride ridge single-mode waveguides have also been fabricated. The waveguide core cross section is 250 nm × 160 nm. Light is focused above the waveguide plane in 2.35-μm diameter spots. The actual probes present two output focusing gratings on the shank