The progress in optoelectronics and power electronics devices and their industrial applications has been remarkable since the beginning of the 21st century. Gallium nitride (GaN) based devices have shown high efficiency and good reliability, but their full potential is hindered by the shortage of native substrates. The Na-flux technique has the ability to produce high quality and low cost bulk GaN. At UCSB, a novel Na-flux system was designed by Von Dollen et al. to monitor GaN growth in-situ. In addition, they demonstrated the fastest growth rate (>50 μm/h) reported for this technique. However, the main challenges such as low structural quality, high impurity, and opaqueness were usually noticed in the grown GaN. Furthermore, the poor ...