As technology scales into smaller feature sizes, electromigration (EM) has become a progressively severe reliability challenge due to increased interconnect current densities. It may lead to an increase in wire resistance thus resulting in functional failure of the system. In other words, the reliability of very large scale integrated (VLSI) circuits is increasingly endangered by EM. Therefore, to ensure reliable circuits, it is important to shift today’s design flow from the traditional EM verification towards an EM-aware design methodology.Since power grid wires experience the largest current flows on a chip, they are more susceptible to long-term reliability issues and functional failures. The interconnect wire in power grid networks usu...
Technology scaling has led to further processor integration, and future manycore chips will have mor...
The advance of semiconductor technology not only enables integrated circuits with higher density and...
Power integrity has become a critical issue in nano-scale VLSI design. With technology scaling, the ...
As technology scales into smaller feature sizes, electromigration (EM) has become a progressively se...
Long-term reliability is a major concern in modern VLSI design. Literature has shown that reliabilit...
A major challenge in modern chip design is the design and analysis of the chip's power grid -- the n...
International audiencePower gating is an efficient technique for reducing leakage power by disconnec...
Electromigration (EM) is a key reliability concern in chip power/ ground (p/g) grids, which has been...
International audiencePower gating is an efficient technique for reducing leakage power in electroni...
International audienceA recently proposed methodology for electromigration (EM) assessment in on-chi...
Electromigration (EMG) is a consequence of miniaturization of integrated circuits in general and the...
Electromigration is re-emerging as a significant problem in modern integrated circuits (IC). Especia...
Electromigration (EM) is becoming a progressively severe reliability challenge due to increased inte...
Electromigration in metal lines has re-emerged as a significant concern in modern VLSI circuits. The...
International audienceWe present a reliability study of power grids in power-gated chips. We investi...
Technology scaling has led to further processor integration, and future manycore chips will have mor...
The advance of semiconductor technology not only enables integrated circuits with higher density and...
Power integrity has become a critical issue in nano-scale VLSI design. With technology scaling, the ...
As technology scales into smaller feature sizes, electromigration (EM) has become a progressively se...
Long-term reliability is a major concern in modern VLSI design. Literature has shown that reliabilit...
A major challenge in modern chip design is the design and analysis of the chip's power grid -- the n...
International audiencePower gating is an efficient technique for reducing leakage power by disconnec...
Electromigration (EM) is a key reliability concern in chip power/ ground (p/g) grids, which has been...
International audiencePower gating is an efficient technique for reducing leakage power in electroni...
International audienceA recently proposed methodology for electromigration (EM) assessment in on-chi...
Electromigration (EMG) is a consequence of miniaturization of integrated circuits in general and the...
Electromigration is re-emerging as a significant problem in modern integrated circuits (IC). Especia...
Electromigration (EM) is becoming a progressively severe reliability challenge due to increased inte...
Electromigration in metal lines has re-emerged as a significant concern in modern VLSI circuits. The...
International audienceWe present a reliability study of power grids in power-gated chips. We investi...
Technology scaling has led to further processor integration, and future manycore chips will have mor...
The advance of semiconductor technology not only enables integrated circuits with higher density and...
Power integrity has become a critical issue in nano-scale VLSI design. With technology scaling, the ...