Add to ORKGThe present work deals with the phenomena associated with the electrochemical dissolution of Cu in phosphoric acid. The investigation employs not only standard electrochemical methods, but also the purely physical methods of microscopy and schlieren analysis.U of I Onlydissertatio
tudied er spe ate du s are ffectiv rodyn 783 # A ived J a prototype for fundamental studies of elect...
The electropolishing of rotating copper-disk electrodes in concentrated phosphoric acid is studied b...
The electrochemical method, digital holography and SEM have been combined to investigate the anodic ...
The present work deals with the phenomena associated with the electrochemical dissolution of Cu in ...
The electrochemical behaviour of Cu in different phosphate buffers is studied through electrochemica...
The electrochemical behaviour of Cu in different phosphate buffers is studied through electrochemica...
The rate of copper dissolution in presence of phosphoric acid tert-butanol electropolishing mixtures...
The electrochemical behaviour of copper in 6.0 mol 1-1 sulfuric acid at 30°C, was studied by means o...
In Electrochemical Mechanical Planarization process (ECMP), concentrated phosphoric acid is usually ...
The electrochemistry of copper deposition and dissolution in chloride–sulphate electrolytes has been...
The anodic dissolution reaction of copper in copper electro-refining was studied by considering the ...
The salt-film and water acceptor mechanisms were generally accepted mechanisms for Cu electrochemica...
The anodic behavior of copper was investigated with potentiostatic method in a 45 wt% phosphoric aci...
The thin film shown by Hoar and Farthing to exist on the surface of copper during electropolishing i...
The anodic behavior of copper was investigated with potentiostatic method in a 45 wt% phosphoric aci...
tudied er spe ate du s are ffectiv rodyn 783 # A ived J a prototype for fundamental studies of elect...
The electropolishing of rotating copper-disk electrodes in concentrated phosphoric acid is studied b...
The electrochemical method, digital holography and SEM have been combined to investigate the anodic ...
The present work deals with the phenomena associated with the electrochemical dissolution of Cu in ...
The electrochemical behaviour of Cu in different phosphate buffers is studied through electrochemica...
The electrochemical behaviour of Cu in different phosphate buffers is studied through electrochemica...
The rate of copper dissolution in presence of phosphoric acid tert-butanol electropolishing mixtures...
The electrochemical behaviour of copper in 6.0 mol 1-1 sulfuric acid at 30°C, was studied by means o...
In Electrochemical Mechanical Planarization process (ECMP), concentrated phosphoric acid is usually ...
The electrochemistry of copper deposition and dissolution in chloride–sulphate electrolytes has been...
The anodic dissolution reaction of copper in copper electro-refining was studied by considering the ...
The salt-film and water acceptor mechanisms were generally accepted mechanisms for Cu electrochemica...
The anodic behavior of copper was investigated with potentiostatic method in a 45 wt% phosphoric aci...
The thin film shown by Hoar and Farthing to exist on the surface of copper during electropolishing i...
The anodic behavior of copper was investigated with potentiostatic method in a 45 wt% phosphoric aci...
tudied er spe ate du s are ffectiv rodyn 783 # A ived J a prototype for fundamental studies of elect...
The electropolishing of rotating copper-disk electrodes in concentrated phosphoric acid is studied b...
The electrochemical method, digital holography and SEM have been combined to investigate the anodic ...