International audienceAlumino-silicate coatings and structures formed from alumino-silicate and amorphous chalcogenide submicrometer layers were prepared by pulsed laser deposition. Fabricated thin films were characterized in terms of their structure, morphology, topography, chemical composition, optical properties, and basic anticorrosive functionality. Prepared coatings are amorphous, smooth, without micrometer-sized droplets, with chemical composition close to parent targets. Spectral dependencies of refractive indices and extinction coefficients were derived from variable angle spectroscopic ellipsometry data. Amorphous chalcogenide/alumino-silicate structures present large refractive index differences of individual layers (Δn ~ 1.2 at ...
International audienceThe deposition of Ge25Sb10S65 and Ge25Sb10Se65 amorphous chalcogenide thin fil...
Waveguiding Ti:sapphire on quartz and chalcogenide glass on fused silica substrates were prepared by...
This study focuses on the atomic layer deposition (ALD) of high quality SiO2 thin films for optical ...
International audienceAmorphous chalcogenide and alumino-silicate thin films were fabricated by the ...
Pulsed laser deposited amorphous chalcogenide and alumino-silicate thin films and their multilayered...
We report on the deposition and characterization of hafnium silicate and aluminium silicate thin fil...
Sintered targets of Al2O3 are removed by CO(2-) and excimer laser radiation and deposited as thin fi...
International audienceThin films of amorphous alumina were fabricated using pulsed laser deposition....
Sintered targets of ZrO2 and Al2O3 are ablated by KrF excimer laser radiation. The processing gas at...
International audienceThe chemical, structural, mechanical and optical properties of thin aluminum o...
Antireflection (AR) coatings are indispensable in numerous optical applications and are increasingly...
Thin films of aluminum oxide of thickness 293–433 nm were grown on fused silica substrates by pulsed...
Thin film optical waveguides of the chalcogenide glass Ga-La-S have been deposited on substrates of ...
International audienceAmorphous chalcogenide thin films were fabricated by the pulsed laser depositi...
The present study concerns development of yttria stabilized zirconia (YSZ), Al2O3 and a multilayer o...
International audienceThe deposition of Ge25Sb10S65 and Ge25Sb10Se65 amorphous chalcogenide thin fil...
Waveguiding Ti:sapphire on quartz and chalcogenide glass on fused silica substrates were prepared by...
This study focuses on the atomic layer deposition (ALD) of high quality SiO2 thin films for optical ...
International audienceAmorphous chalcogenide and alumino-silicate thin films were fabricated by the ...
Pulsed laser deposited amorphous chalcogenide and alumino-silicate thin films and their multilayered...
We report on the deposition and characterization of hafnium silicate and aluminium silicate thin fil...
Sintered targets of Al2O3 are removed by CO(2-) and excimer laser radiation and deposited as thin fi...
International audienceThin films of amorphous alumina were fabricated using pulsed laser deposition....
Sintered targets of ZrO2 and Al2O3 are ablated by KrF excimer laser radiation. The processing gas at...
International audienceThe chemical, structural, mechanical and optical properties of thin aluminum o...
Antireflection (AR) coatings are indispensable in numerous optical applications and are increasingly...
Thin films of aluminum oxide of thickness 293–433 nm were grown on fused silica substrates by pulsed...
Thin film optical waveguides of the chalcogenide glass Ga-La-S have been deposited on substrates of ...
International audienceAmorphous chalcogenide thin films were fabricated by the pulsed laser depositi...
The present study concerns development of yttria stabilized zirconia (YSZ), Al2O3 and a multilayer o...
International audienceThe deposition of Ge25Sb10S65 and Ge25Sb10Se65 amorphous chalcogenide thin fil...
Waveguiding Ti:sapphire on quartz and chalcogenide glass on fused silica substrates were prepared by...
This study focuses on the atomic layer deposition (ALD) of high quality SiO2 thin films for optical ...