In order to contribute to the in-depth understanding of doping at the nanoscale, we have studied the influence of the insertion of boron and phosphorus atoms on the optical and structural properties of silicon nanocrystals. Using the ultra-vacuum evaporation technique, we prepared silicon nanocrystals inserted in a silica matrix with two types of layers: thin films of silicon oxides SiO1.5 and SiO/SiO2 multilayers containing boron or phosphorus impurities with different and controlled concentrations. While phosphorus facilitates the demixing of silicon oxide, which has led to an increase in the size of silicon nanocrystals, boron seems to have no measurable influence on the appearance and growth of nanocrystals. The evolution of the photolu...