In this study, the characteristic properties and plasma parameters of capacitive radio frequency (RF) argon (Ar) discharge and supplementary discharge at low pressure are investigated with optical emission spectroscopy (OES). The wavelengths of spectral lines from OES are obtained between 650-900 nm. Using OES lines and related experimental data, the electron temperatures for different RF power, flow, and measurement periods are determined. Eventually, the properties of plasma including the electron temperature are identified. In addition, the numerical modelling of the discharge parameters is carried out by using the "extended" fluid model for plasma, and consistency between numerical and experimental results is discussed
A hybrid Monte Carlo-fluid model has been developed for the description of electrons, argon ions, an...
The electron dynamics in the low-pressure operation regime (< 5 Pa) of a neon capacitively coupled p...
This paper describes the use of Optical Emission Spectroscopy (OES) to measure electron densities an...
Low pressure RF plasmas are widely used in the microelectronics industry for the production of integ...
In this study we designed an RF plasma circuit. By using argon as plasma-forming gas, we investigate...
The properties of a pulsed radio frequency capacitive discharge are investigated at atmospheric pres...
155-162In this paper, a technique for the determination of electron temperatures and electron densit...
Recent technological achievements in the area of semiconductor technology have been the reason for t...
International audienceThis paper uses experiments and modelling to study capacitively coupled radio-...
The line-ratio method of optical emission spectroscopy (OES) is used for the diagnosis of plasma par...
Experimental data related to 40 MHz Argon plasma parameters in the RF power and pressure ranges of 2...
Experimental data related to 40 MHz Argon plasma parameters in the RF power and pressure ranges of 2...
In this work, an atmospheric pressure plasma jet generated by AC voltage with 71 kHz frequency in Ar...
PosterInternational audienceThe methane decomposition in low pressure radiofrequency (13.56 MHz) lea...
The low pressure capacitive radio frequency air discharge used for the processing of metal products ...
A hybrid Monte Carlo-fluid model has been developed for the description of electrons, argon ions, an...
The electron dynamics in the low-pressure operation regime (< 5 Pa) of a neon capacitively coupled p...
This paper describes the use of Optical Emission Spectroscopy (OES) to measure electron densities an...
Low pressure RF plasmas are widely used in the microelectronics industry for the production of integ...
In this study we designed an RF plasma circuit. By using argon as plasma-forming gas, we investigate...
The properties of a pulsed radio frequency capacitive discharge are investigated at atmospheric pres...
155-162In this paper, a technique for the determination of electron temperatures and electron densit...
Recent technological achievements in the area of semiconductor technology have been the reason for t...
International audienceThis paper uses experiments and modelling to study capacitively coupled radio-...
The line-ratio method of optical emission spectroscopy (OES) is used for the diagnosis of plasma par...
Experimental data related to 40 MHz Argon plasma parameters in the RF power and pressure ranges of 2...
Experimental data related to 40 MHz Argon plasma parameters in the RF power and pressure ranges of 2...
In this work, an atmospheric pressure plasma jet generated by AC voltage with 71 kHz frequency in Ar...
PosterInternational audienceThe methane decomposition in low pressure radiofrequency (13.56 MHz) lea...
The low pressure capacitive radio frequency air discharge used for the processing of metal products ...
A hybrid Monte Carlo-fluid model has been developed for the description of electrons, argon ions, an...
The electron dynamics in the low-pressure operation regime (< 5 Pa) of a neon capacitively coupled p...
This paper describes the use of Optical Emission Spectroscopy (OES) to measure electron densities an...