Metal induced crystallization is a widely used method to form crystalline/polycrystalline structures at low temperatures. In this work, Au was applied to enhance the crystallization of amorphous Ge films. Ge films with thicknesses of similar to 1.5 mu m were fabricated by electron beam evaporation on c-Si substrate with and without very thin Au layer. Crystallization properties of Ge films were analyzed for different growth and post annealing temperatures varied between 270 degrees C and 730 degrees C. The structures of polycrystalline Ge films were investigated by employing X-ray diffraction (XRD), Raman spectra and scanning electron microscopy (SEM)
This work reports on the low-temperature crystallization of hydrogenated amorphous germanium (a-Ge:H...
Amorphous thin Ge films were deposited by plasma enhanced chemical vapor deposition (PECVD) on Si(11...
Amorphous thin Ge films were deposited by plasma enhanced chemical vapor deposition (PECVD) on Si(11...
Gold-induced (Au-) crystallization of amorphous germanium (-Ge) thin films was investigated by depos...
Silver-induced crystallizations of amorphous germanium (alpha-Ge) thin films were fabricated through...
Metal-induced (Fe-, Ni- and Co-) crystallization of amorphous germanium (a-Ge) thin films were inves...
We have investigated the relationship between structural and electrical properties of Ge thin films ...
Metal induced crystallization (MIC) is a technique that lowers the crystallization temperature of am...
Metal induced crystallization (MIC) is a technique that lowers the crystallization temperature of am...
The present work contributes to establishing the role of hydrogenation and of the substrates in the ...
The present work contributes to establishing the role of hydrogenation and of the substrates in the ...
Following our previous studies on crystallization induced by electron irradiation, we have investiga...
The initial stages of interfacial interactions between Ag nanoparticles and amorphous Ge (a-Ge) film...
The crystallization of sputter-deposited substrate-free films of amorphous germanium was induced by ...
The crystallization of amorphous Ge(a-Ge) in an Al (134 nm) and a-Ge (108 nm) thin-film bilayer depo...
This work reports on the low-temperature crystallization of hydrogenated amorphous germanium (a-Ge:H...
Amorphous thin Ge films were deposited by plasma enhanced chemical vapor deposition (PECVD) on Si(11...
Amorphous thin Ge films were deposited by plasma enhanced chemical vapor deposition (PECVD) on Si(11...
Gold-induced (Au-) crystallization of amorphous germanium (-Ge) thin films was investigated by depos...
Silver-induced crystallizations of amorphous germanium (alpha-Ge) thin films were fabricated through...
Metal-induced (Fe-, Ni- and Co-) crystallization of amorphous germanium (a-Ge) thin films were inves...
We have investigated the relationship between structural and electrical properties of Ge thin films ...
Metal induced crystallization (MIC) is a technique that lowers the crystallization temperature of am...
Metal induced crystallization (MIC) is a technique that lowers the crystallization temperature of am...
The present work contributes to establishing the role of hydrogenation and of the substrates in the ...
The present work contributes to establishing the role of hydrogenation and of the substrates in the ...
Following our previous studies on crystallization induced by electron irradiation, we have investiga...
The initial stages of interfacial interactions between Ag nanoparticles and amorphous Ge (a-Ge) film...
The crystallization of sputter-deposited substrate-free films of amorphous germanium was induced by ...
The crystallization of amorphous Ge(a-Ge) in an Al (134 nm) and a-Ge (108 nm) thin-film bilayer depo...
This work reports on the low-temperature crystallization of hydrogenated amorphous germanium (a-Ge:H...
Amorphous thin Ge films were deposited by plasma enhanced chemical vapor deposition (PECVD) on Si(11...
Amorphous thin Ge films were deposited by plasma enhanced chemical vapor deposition (PECVD) on Si(11...