We used Density Functional Theory (DFT) to study the Fermi level pinning and Schottky barrier height in metal-MoS2 contacts. We showed that the Fermi level de-pinning could be attained by controlling the distance between the metal and MoS2. In particular, with proper buffer layers and the use of back-gated structures, the Schottky barrier height can be practically zeroed in some metal-MoS2 stacks, which is important to attain Ohmic contacts
The Schottky barriers of transition metal silicides on silicon are characterized by two anomalous fe...
A comprehensive understanding of the energy level alignment mechanisms between two dimensional 2D ...
Understanding the electronic properties between molybdenum disulfide (MoS2) and metal electrodes is ...
Fermi level pinning (FLP) in metal-MoS2 contacts induces large Schottky barrier heights which in tur...
Density functional theory calculations are performed to unravel the nature of the contact between me...
A low Schottky barrier height (SBH) at source/drain contact is essential for achieving high drive cu...
Making a metal contact to the two-dimensional semiconductor MoS 2 without creating a Schottky barrie...
Using DFT calculations, we investigate the effects of the type, location, and density of point defec...
Understanding the electronic contact between molybdenum disulfide (MoS2) and metal electrodes is vit...
Although many prototype devices based on two-dimensional (2D) MoS2 have been fabricated and wafer sc...
First principle based atomistic simulations are carried out to study the contact interface between m...
Weaker Fermi level pinning (FLP) at the Schottky barriers of 2D semiconductors is electrically desir...
Schottky barrier height (SBH) engineering of contact structures is a primary challenge to achieve hi...
Although monolayer transition metal dichalcogenides (TMDs) exhibit superior optical and electrical c...
This article was supported by the German Research Foundation (DFG) and the Open Access Publication F...
The Schottky barriers of transition metal silicides on silicon are characterized by two anomalous fe...
A comprehensive understanding of the energy level alignment mechanisms between two dimensional 2D ...
Understanding the electronic properties between molybdenum disulfide (MoS2) and metal electrodes is ...
Fermi level pinning (FLP) in metal-MoS2 contacts induces large Schottky barrier heights which in tur...
Density functional theory calculations are performed to unravel the nature of the contact between me...
A low Schottky barrier height (SBH) at source/drain contact is essential for achieving high drive cu...
Making a metal contact to the two-dimensional semiconductor MoS 2 without creating a Schottky barrie...
Using DFT calculations, we investigate the effects of the type, location, and density of point defec...
Understanding the electronic contact between molybdenum disulfide (MoS2) and metal electrodes is vit...
Although many prototype devices based on two-dimensional (2D) MoS2 have been fabricated and wafer sc...
First principle based atomistic simulations are carried out to study the contact interface between m...
Weaker Fermi level pinning (FLP) at the Schottky barriers of 2D semiconductors is electrically desir...
Schottky barrier height (SBH) engineering of contact structures is a primary challenge to achieve hi...
Although monolayer transition metal dichalcogenides (TMDs) exhibit superior optical and electrical c...
This article was supported by the German Research Foundation (DFG) and the Open Access Publication F...
The Schottky barriers of transition metal silicides on silicon are characterized by two anomalous fe...
A comprehensive understanding of the energy level alignment mechanisms between two dimensional 2D ...
Understanding the electronic properties between molybdenum disulfide (MoS2) and metal electrodes is ...