This paper reports experimental investigation of the discharge behavior of pulse-enhanced vacuum arc evaporation (PEVAE) with titanium target. The PEVAE discharge was analyzed by optical emission spectroscopy, monitoring of substrate current and the electron probe current at different N2 pressure or arc current, respectively, compared to that of conventional dc arc. The results show that during the PEVAE process the electron probe current was significantly enhanced particularly at a higher pulsed current. An increase of up to more than 1–2 times was observed. Electron emission was substantially enhanced. The substrate current increased linearly with arc current regardless of the dc or PEVAE mode; however, the latter led to a larger cur...
International audienceHigh-speed camera imaging and optical emission spectroscopy have been used for...
DC arc plasma from Ti, Al, and Ti(1-x)A(l)x (x = 0.16, 0.25, 0.50, and 0.70) compound cathodes has b...
Conventional vacuum dc-arc sources are limited with regard to the reachable arc current. For these d...
The characteristics of plasmas in a titanium hydride vacuum arc ion source were experimentally inves...
We have studied the utilization of TiB2 cathodes for thin film deposition in a DC vacuum arc system....
Abstract -The paper reviews the results of vacuum arc experimental investigations made collaborative...
Herein, we investigate the influence of powder metallurgical manufactured Ti0.5Al0.5 cathode grain s...
The MEVVA ion source can produce high current pulsed beams of metallic ions using a metal vapor vacu...
Cathodic arc evaporation (CAE) is a widely used technique for generating highly ionised plasma from ...
Plasma-assisted techniques have been widely used for deposition of high quality thin films and metal...
Thin Ti films were grown on silicon (100) wafers by means of a hollow cathode arc evaporation device...
Abstract – Results of experimental investigation of the pulse vacuum arc of the MEVVA type with diff...
This method of laser-induced vacuum arc evaporation includes advantages of the laser pulse vapour de...
Spectral emission lines from a low pressure d-c arc discharge with a Ti cathode were studied in vari...
Vacuum arc ion sources, commonly also known as "Mevva" ion sources, are used to generate intense pu...
International audienceHigh-speed camera imaging and optical emission spectroscopy have been used for...
DC arc plasma from Ti, Al, and Ti(1-x)A(l)x (x = 0.16, 0.25, 0.50, and 0.70) compound cathodes has b...
Conventional vacuum dc-arc sources are limited with regard to the reachable arc current. For these d...
The characteristics of plasmas in a titanium hydride vacuum arc ion source were experimentally inves...
We have studied the utilization of TiB2 cathodes for thin film deposition in a DC vacuum arc system....
Abstract -The paper reviews the results of vacuum arc experimental investigations made collaborative...
Herein, we investigate the influence of powder metallurgical manufactured Ti0.5Al0.5 cathode grain s...
The MEVVA ion source can produce high current pulsed beams of metallic ions using a metal vapor vacu...
Cathodic arc evaporation (CAE) is a widely used technique for generating highly ionised plasma from ...
Plasma-assisted techniques have been widely used for deposition of high quality thin films and metal...
Thin Ti films were grown on silicon (100) wafers by means of a hollow cathode arc evaporation device...
Abstract – Results of experimental investigation of the pulse vacuum arc of the MEVVA type with diff...
This method of laser-induced vacuum arc evaporation includes advantages of the laser pulse vapour de...
Spectral emission lines from a low pressure d-c arc discharge with a Ti cathode were studied in vari...
Vacuum arc ion sources, commonly also known as "Mevva" ion sources, are used to generate intense pu...
International audienceHigh-speed camera imaging and optical emission spectroscopy have been used for...
DC arc plasma from Ti, Al, and Ti(1-x)A(l)x (x = 0.16, 0.25, 0.50, and 0.70) compound cathodes has b...
Conventional vacuum dc-arc sources are limited with regard to the reachable arc current. For these d...