Surface-micromachined absolute pressure sensor and a method for manufacturing thereof

The present publication discloses a capacitive pressure sensor structure, in particular for measurement of absolute pressure, and a method for manufacturing the sensor. The sensor comprises at least one fixed electrode (3), and at least one movable electrode (6, 7) electrically isolated from said fixed electrode (3) and spaced apart (10) from said fixed electrode (3). According to the invention, a portion of said movable electrode (6, 7) is formed from a porous polycrystalline silicon layer (6) that in a finished component remains as an integral portion of said flexibly movable electrode (6, 7).Patent family as of 26.8.2021 AT514652 E 20110715 AT20010982512T 20011107 AU2002214074 AA 20020521 AU20020214074 20011107 CN1225400 C 20051102 CN20018021908 20011107 CN1486277 A 20040331 CN20018021908 20011107 DE60144887 D1 20110818 DE20016044887 20011107 EP1337458 A1 20030827 EP20010982512 20011107 EP1337458 B1 20110629 EP20010982512 20011107 FI112644 B 20031231 FI20000002472 20001110 FI20002472 A 20020511 FI20000002472 20001110 FI20002472 A0 20001110 FI20000002472 20001110 IN00537KN2003 A 20060127 IN2003KN00537 20030429 JP2004513356 T2 20040430 JP20020541035T 20011107 JP3857231 B2 20061213 JP20020541035T 20011107 RU2003113320 A 20041110 RU20030113320 20011107 RU2258914 C2 20050820 RU20030113320 20011107 US6931935 BB 20050823 US20010416267 20011107 US2004020303 AA 20040205 US20030416267 20030509 WO0238491 A1 20020516 WO2001FI00970 20011107Link to current patent family on right