The continuous scaling of interconnect wires in deep submicron (DSM)circuits result in increased interconnect delay, power and crosstalk noise. In this dissertation, we address the problem of multi-metric optimization at post layout level in the design of deep submicron designs and develop a game theoretic framework for its solution. Traditional approaches in the literature can only perform single metric optimization and cannot handle multiple metrics. However, in interconnect optimization, the simultaneous optimization of multiple parameters such as delay, crosstalk noise and power is necessary and critical. Thus, the work described in this dissertation research addressing multi-metric optimization is an important contribution.Specifically...
The lithography used for 32 nanometers and smaller VLSI process technologies restricts the admissibl...
Abstract—With delays due to the physical interconnect domi-nating the overall logic path delays, cir...
The advent of new technologies brings revolutions in the fields of VLSI design and high performance ...
The continuous scaling of interconnect wires in deep submicron (DSM)circuits result in increased int...
In the field of VLSI circuit optimization, the scaling of semiconductor devices has led to the minia...
This paper presents an overview of recent advances on modeling and layout optimization of devices an...
This book covers layout design and layout migration methodologies for optimizing multi-net wire stru...
Interconnect has become the dominating factor in determining circuit performance and reliability in ...
In this paper, we quantify the impact of global interconnect optimi-zation techniques that address s...
In this paper, we formulate a new class of optimization problem, named the general CH-posynomial pro...
Abstract—This paper addresses the critical problem of global wire optimization for nanometer scale v...
Ultra-deep submicron circuits require accurate modeling of gate delay in order to meetaggressive tim...
The lithography used for 32 nanometers and smaller VLSI process technologies restricts the admissibl...
This paper presents a novel gate sizing methodology to mini-mize the leakage power in the presence o...
This paper presents design optimization of time responses of high-speed VLSI interconnects modeled b...
The lithography used for 32 nanometers and smaller VLSI process technologies restricts the admissibl...
Abstract—With delays due to the physical interconnect domi-nating the overall logic path delays, cir...
The advent of new technologies brings revolutions in the fields of VLSI design and high performance ...
The continuous scaling of interconnect wires in deep submicron (DSM)circuits result in increased int...
In the field of VLSI circuit optimization, the scaling of semiconductor devices has led to the minia...
This paper presents an overview of recent advances on modeling and layout optimization of devices an...
This book covers layout design and layout migration methodologies for optimizing multi-net wire stru...
Interconnect has become the dominating factor in determining circuit performance and reliability in ...
In this paper, we quantify the impact of global interconnect optimi-zation techniques that address s...
In this paper, we formulate a new class of optimization problem, named the general CH-posynomial pro...
Abstract—This paper addresses the critical problem of global wire optimization for nanometer scale v...
Ultra-deep submicron circuits require accurate modeling of gate delay in order to meetaggressive tim...
The lithography used for 32 nanometers and smaller VLSI process technologies restricts the admissibl...
This paper presents a novel gate sizing methodology to mini-mize the leakage power in the presence o...
This paper presents design optimization of time responses of high-speed VLSI interconnects modeled b...
The lithography used for 32 nanometers and smaller VLSI process technologies restricts the admissibl...
Abstract—With delays due to the physical interconnect domi-nating the overall logic path delays, cir...
The advent of new technologies brings revolutions in the fields of VLSI design and high performance ...