Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering (vol152, pg 252, 2018)

Correia, F. C.
Salvador, P. B.
Ribeiro, J. M.
Mendes, A.
Tavares, C. J.

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Publication date

January 2018

DOI

10.1016/j.vacuum.2018.05.037

Publisher

Elsevier BV

Journal

Vacuum

Abstract

The authors regret the published article included incorrect Power Factor values in graphs of Figures 4 and 10b). This also means that the values in the body of the text were also incorrect. Additionally, figures 2, 3, 8, 9, 13 and 14 included a formatting error in the top X axis of the graphs. The authors would like to apologise for any inconvenience caused.- (undefined

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Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering (vol152, pg 252, 2018)

Abstract

Extracted data

Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering (vol152, pg 252, 2018)

Abstract

Extracted data

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